Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
MN

Markus Nopper — 16 Patents

AMD: 12 patents #1,029 of 9,280Top 15%
Globalfoundries: 4 patents #817 of 4,424Top 20%
Dresden, DE: #109 of 3,254 inventorsTop 4%
Overall (All Time): #284,196 of 4,157,543Top 7%
16 Patents All Time
Markus Nopper has been granted 16 US patents while listed as an inventor at AMD. The first was granted in 2003 and the most recent in November 2014. Markus Nopper ranks #284,196 of 4,157,543 US inventors in our database (top 6.8%). Patent records list Markus Nopper in Dresden, DE.

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8883610 Microstructure device including a metallization structure with self-aligned air gaps between closely spaced metal lines Robert Seidel, Axel Preusse 2014-11-11 $1,428,000
8389401 Contact elements of semiconductor devices formed on the basis of a partially applied activation layer Robert Seidel, Axel Preusse 2013-03-05 $2,179,000
8323471 Automatic deposition profile targeting Thomas Ortleb, Dirk Wollstein 2012-12-04 $1,677,000
8314494 Metal cap layer of increased electrode potential for copper-based metal regions in semiconductor devices Axel Preusse, Robert Seidel 2012-11-20 $2,815,000
7947158 Apparatus and method for removing bubbles from a process liquid Helge Hartz, Axel Preusse 2011-05-24 $15,194,000
7899570 Advanced automatic deposition profile targeting and control by applying advanced polish endpoint system feedback Thomas Ortleb, Thomas Harold Roessler 2011-03-01 $8,863,000
7781329 Reducing leakage in dielectric materials including metal regions including a metal cap layer in semiconductor devices Axel Preusse, Thomas Ortleb, Juergen Boemmels 2010-08-24 $5,281,000
7781343 Semiconductor substrate having a protection layer at the substrate back side Tobias Letz, Holger Schuehrer 2010-08-24 $5,281,000
7615103 Apparatus and method for removing bubbles from a process liquid Helge Hartz, Axel Preusse 2009-11-10 $22,613,000
7560381 Technique for metal deposition by electroless plating using an activation scheme including a substrate heating process Axel Preusse, Matthias Bonkass 2009-07-14 $9,035,000
7517782 Method of forming a metal layer over a patterned dielectric by wet chemical deposition including an electroless and a powered phase Axel Preusse, Susanne Wehner 2009-04-14 $5,338,000
7476552 Method of reworking a semiconductor structure Axel Preusse, Uwe Stoeckgen 2009-01-13 $12,331,000
7169664 Method of reducing wafer contamination by removing under-metal layers at the wafer edge Axel Preusse, Holger Schührer 2007-01-30 $15,947,000
6958247 Method of electroplating copper over a patterned dielectric layer to enhance process uniformity of a subsequent CMP process Gerd Marxsen, Axel Preusse, Frank Mauersberger 2005-10-25 $11,546,000
6951816 Method of forming a metal layer over patterned dielectric by electroless deposition using a catalyst Axel Preusse 2005-10-04 $16,745,000
6620726 Method of forming metal lines having improved uniformity on a substrate Axel Preusse, Gerd Marxsen 2003-09-16 $3,735,000