Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
US

Uwe Stoeckgen — 8 Patents

AMD: 6 patents #1,996 of 9,280Top 25%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
Dresden, DE: #308 of 3,254 inventorsTop 10%
Overall (All Time): #600,572 of 4,157,543Top 15%
8 Patents All Time
Uwe Stoeckgen has been granted 8 US patents while listed as an inventor at AMD. The first was granted in 2004 and the most recent in February 2015. Uwe Stoeckgen ranks #600,572 of 4,157,543 US inventors in our database (top 14.4%). Patent records list Uwe Stoeckgen in Dresden, DE.

Patents per Year

Patents granted per year, 2004 to 2015Bar chart with a peak of 2 patents in 2004.peak 22004: 2 patents20042006: 1 patents20062009: 1 patents20092011: 1 patents20112013: 1 patents20132014: 1 patents20142015: 1 patents2015

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8951900 Contact elements of a semiconductor device formed by electroless plating and excess material removal with reduced sheer forces Axel Preusse, Norbert Schroeder 2015-02-10 $2,183,000
8622783 Method and system for controlling chemical mechanical polishing by controllably moving a slurry outlet Axel Kiesel, John Lampett, Heiko Wundram 2014-01-07 $3,415,000
8450197 Contact elements of a semiconductor device formed by electroless plating and excess material removal with reduced sheer forces Axel Preusse, Norbert Schroeder 2013-05-28 $3,942,000
7980922 Method and system for controlling chemical mechanical polishing by controllably moving a slurry outlet Axel Kiesel, John Lampett, Heiko Wundram 2011-07-19 $3,440,000
7476552 Method of reworking a semiconductor structure Axel Preusse, Markus Nopper 2009-01-13 $12,331,000
7150675 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner Jens Kramer, Jens Kunath 2006-12-19 $26,185,000
6752697 Apparatus and method for chemical mechanical polishing of a substrate Gerd Marxsen 2004-06-22 $4,162,000
6699107 Polishing head and apparatus with an improved pad conditioner for chemical mechanical polishing Gerd Marxsen 2004-03-02 $3,635,000