Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner

Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner

US Patent 7150675 · Granted Dec 19, 2006

Estimated economic value: $26,185,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wet multi-plate clutch2024
Chemical mechanical polishing apparatus2019
Wafer processing apparatuses and methods of operating the same2017
Chemical mechanical polishing method and apparatus2016
Contact elements of a semiconductor device formed by electroless plating and exc2015
Method and system for controlling chemical mechanical polishing by controllably 2014
Contact elements of a semiconductor device formed by electroless plating and exc2013
Method and system for controlling chemical mechanical polishing by controllably 2011
Method of reworking a semiconductor structure2009
Method and system for controlling the chemical mechanical polishing by using a s2007
Method and system for controlling the chemical mechanical polishing by using a s2005
Apparatus and method for chemical mechanical polishing of a substrate2004