Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502209 | Multi-step location specific process for substrate edge profile correction for GCIB system | Noel Russell, Vincent Gizzo, Joshua LaRose, Steven P. Caliendo | 2016-11-22 |
| 9105443 | Multi-step location specific process for substrate edge profile correction for GCIB system | Noel Russell, Vincent Gizzo, Joshua LaRose, Steven P. Caliendo | 2015-08-11 |
| 9017933 | Method for integrating low-k dielectrics | Junjun Liu, Dorel I. Toma | 2015-04-28 |
| 8980651 | Overlay measurement for a double patterning | Shifang Li | 2015-03-17 |
| 8916055 | Method and device for controlling pattern and structure formation by an electric field | Jozef Brcka, Jacques Faguet, Eric M. Lee | 2014-12-23 |
| 8895942 | Dielectric treatment module using scanning IR radiation source | Junjun Liu, Jacques Faguet, Eric M. Lee, Dorel I. Toma | 2014-11-25 |
| 8530247 | Control of implant pattern critical dimensions using STI step height offset | Brian Douglas Reid, James D. Bernstein, Howie Hui Yang, Mark Boehm | 2013-09-10 |
| 8444848 | Electrochemical substrate slicing using electromagnetic wave excitation | Junjun Liu, Dorel I. Toma | 2013-05-21 |
| 8242460 | Ultraviolet treatment apparatus | Junjun Liu, Jacques Faguet, Dorel I. Toma | 2012-08-14 |
| 8048326 | Method and apparatus for determining an etch property using an endpoint signal | Hieu Lam | 2011-11-01 |
| 7972483 | Method of fault detection for material process system | John Donohue | 2011-07-05 |
| 7844559 | Method and system for predicting process performance using material processing tool and sensor data | Hieu Lam, John Christopher Shriner | 2010-11-30 |
| 7713760 | Process system health index and method of using the same | Hieu Lam | 2010-05-11 |
| 7430496 | Method and apparatus for using a pressure control system to monitor a plasma processing system | Hieu Lam | 2008-09-30 |
| 7297287 | Method and apparatus for endpoint detection using partial least squares | David Fatke | 2007-11-20 |
| 7297560 | Method and apparatus for detecting endpoint | — | 2007-11-20 |
| 7213478 | Method for automatic configuration of processing system | Satoshi Harada, Edward C. Hume, III, James E. Willis, Kevin Andrew Chamness, Hieu Lam +1 more | 2007-05-08 |
| 7211196 | Method and system of discriminating substrate type | Hieu Lam | 2007-05-01 |
| 7167766 | Controlling a material processing tool and performance data | Hieu Lam | 2007-01-23 |
| 7127358 | Method and system for run-to-run control | Joseph William Wiseman | 2006-10-24 |
| 6893975 | System and method for etching a mask | Asao Yamashita | 2005-05-17 |
| 6852584 | Method of trimming a gate electrode structure | Lee Chen, Hiromitsu Kambara | 2005-02-08 |
| 6825920 | Method and system of determining chamber seasoning condition by optical emission | Hieu Lam, John Christopher Shriner | 2004-11-30 |
| 6675137 | Method of data compression using principal components analysis | Anthony J. Toprac | 2004-01-06 |
| 6582618 | Method of determining etch endpoint using principal components analysis of optical emission spectra | Anthony J. Toprac | 2003-06-24 |