Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10971411 | Hybrid corrective processing system and method | Joshua LaRose, Brian D. Pfeifer, Vincent Lagana-Gizzo | 2021-04-06 |
| 10665779 | Methods for additive formation of a STT MRAM stack | Jeffrey Smith | 2020-05-26 |
| 10256095 | Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system | Soo Doo Chae, Joshua LaRose, Nicholas Joy, Luis Fernandez, Allen J. Leith +3 more | 2019-04-09 |
| 10109789 | Methods for additive formation of a STT MRAM stack | Jeffrey Smith | 2018-10-23 |
| 10096527 | Hybrid corrective processing system and method | Joshua LaRose, Brian D. Pfeifer, Vincent Lagana-Gizzo | 2018-10-09 |
| 9875947 | Method of surface profile correction using gas cluster ion beam | Soo Doo Chae, Vincent Gizzo, Joshua LaRose, Nicholas Joy | 2018-01-23 |
| 9735019 | Process gas enhancement for beam treatment of a substrate | Michael Graf, Matthew C. Gwinn, Allen J. Leith | 2017-08-15 |
| 9500946 | Sidewall spacer patterning method using gas cluster ion beam | Soo Doo Chae, Youngdon Chang, Il-seok Song | 2016-11-22 |
| 9502209 | Multi-step location specific process for substrate edge profile correction for GCIB system | Hongyu Yue, Vincent Gizzo, Joshua LaRose, Steven P. Caliendo | 2016-11-22 |
| 9123505 | Apparatus and methods for implementing predicted systematic error correction in location specific processing | Vincent Lagana-Gizzo, Joshua LaRose, Soo Doo Chae | 2015-09-01 |
| 9105443 | Multi-step location specific process for substrate edge profile correction for GCIB system | Hongyu Yue, Vincent Gizzo, Joshua LaRose, Steven P. Caliendo | 2015-08-11 |
| 8709944 | Method to alter silicide properties using GCIB treatment | John Hautala, John Gumpher | 2014-04-29 |
| 8703607 | Method to alter silicide properties using GCIB treatment | John Hautala, John Gumpher | 2014-04-22 |
| 8435890 | Method to alter silicide properties using GCIB treatment | John Hautala, John Gumpher | 2013-05-07 |
| 8338806 | Gas cluster ion beam system with rapid gas switching apparatus | Michael Graf, Robert K. Becker, Christopher T. Reddy | 2012-12-25 |
| 8237136 | Method and system for tilting a substrate during gas cluster ion beam processing | John Hautala | 2012-08-07 |
| 8226835 | Ultra-thin film formation using gas cluster ion beam processing | John Hautala, Edmund Burke, Gregory Herdt | 2012-07-24 |
| 8192805 | Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices | Steven R. Sherman, John Hautala | 2012-06-05 |
| 8187971 | Method to alter silicide properties using GCIB treatment | John Hautala, John Gumpher | 2012-05-29 |
| 8048788 | Method for treating non-planar structures using gas cluster ion beam processing | John Hautala | 2011-11-01 |
| 7981483 | Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices | Steven R. Sherman, John Hautala | 2011-07-19 |
| 7871929 | Method of forming semiconductor devices containing metal cap layers | Frank M. Cerio, Jr., Gregory Herdt | 2011-01-18 |
| 7803703 | Metal-germanium physical vapor deposition for semiconductor device defect reduction | Doufeng Yue, Peijun Chen, Douglas E. Mercer | 2010-09-28 |
| 7776743 | Method of forming semiconductor devices containing metal cap layers | Frank M. Cerio, Jr., Gregory Herdt | 2010-08-17 |
| 7754588 | Method to improve a copper/dielectric interface in semiconductor devices | Steven R. Sherman, John Hautala | 2010-07-13 |