Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12378667 | Methods and systems for forming doped silicon nitride films | Xingye Wang, Fu Tang, Eric Jen Cheng Liu, YoungChol Byun | 2025-08-05 |
| 12289157 | Two-phase access authentication method integrating spatial-temporal features in space-air-ground integrated networks | Bin Yang, Shanyun Liu, Xiangming Zhu, Yinan Qi, Xingming Zhang +3 more | 2025-04-29 |
| D983559 | Soap dispenser | — | 2023-04-18 |
| 11501973 | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures | Petri Raisanen, Mark Olstad, Jose Alexandro Romero, Dong Li, Ward Johnson | 2022-11-15 |
| 11318858 | Intelligent electric-vehicle charging station | Zhengxian Zheng, Chunlin He, Weifu Wang, Jun Zhu, Yan LI | 2022-05-03 |
| 11267361 | System and method for ordered charging management of charging station | Chunlin He, Zhengxian Zheng, Xingping Yan | 2022-03-08 |
| 10888299 | Method and apparatus for x-ray imaging and gain calibration of detector and detector bracket | Wei Zhao, Yongtao Tan, Rowland Frederick Saunders | 2021-01-12 |
| 10872771 | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures | Petri Raisanen, Mark Olstad, Jose Alexandro Romero, Dong Li, Ward Johnson | 2020-12-22 |
| 10217025 | Method and apparatus for determining relevance between news and for calculating relevance among multiple pieces of news | Shenzheng Zhang, Shaojun Wei | 2019-02-26 |
| 8372750 | Method and system for improved nickel silicide | Amitabh Jain, Jorge A. Kittl | 2013-02-12 |
| 7825025 | Method and system for improved nickel silicide | Amitabh Jain, Jorge A. Kittl | 2010-11-02 |
| 7803703 | Metal-germanium physical vapor deposition for semiconductor device defect reduction | Doufeng Yue, Noel Russell, Douglas E. Mercer | 2010-09-28 |
| 7511350 | Nickel alloy silicide including indium and a method of manufacture therefor | Duofeng Yue, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul | 2009-03-31 |
| 7465626 | Method for forming a high-k dielectric stack | Tsai Wilman, Mathieu Caymax, Jan Willem Maes | 2008-12-16 |
| 7435672 | Metal-germanium physical vapor deposition for semiconductor device defect reduction | Doufeng Yue, Noel Russell, Douglas E. Mercer | 2008-10-14 |
| 7355255 | Nickel silicide including indium and a method of manufacture therefor | Duofeng Yue, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul | 2008-04-08 |
| 7344985 | Nickel alloy silicide including indium and a method of manufacture therefor | Duofeng Yue, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul | 2008-03-18 |
| 7211516 | Nickel silicide including indium and a method of manufacture therefor | Duofeng Yue, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul | 2007-05-01 |
| 7208398 | Metal-halogen physical vapor deposition for semiconductor device defect reduction | Duofeng Yue, Douglas E. Mercer, Noel Russell | 2007-04-24 |
| 7199032 | Metal silicide induced lateral excessive encroachment reduction by silicon <110> channel stuffing | Duofeng Yue, Sue Crank, Thomas D. Bonifield, Jiong-Ping Lu, Jie Xu | 2007-04-03 |
| 7132365 | Treatment of silicon prior to nickel silicide formation | Sue Crank, Shirin Siddiqui, Deborah J. Riley, Trace Hurd | 2006-11-07 |
| 6143634 | Semiconductor process with deuterium predominance at high temperature | Robert M. Wallace | 2000-11-07 |
| 6140243 | Low temperature process for post-etch defluoridation of metals | Robert M. Wallace, S. Charles Baber, Steven A. Henck | 2000-10-31 |
| 5286340 | Process for controlling silicon etching by atomic hydrogen | John T. Yates, Jr., M. Luigi Colaianni | 1994-02-15 |