| 9842895 |
Single photomask high precision thin film resistor |
Pinghai Hao, Fuchao Wang |
2017-12-12 |
| 9305688 |
Single photomask high precision thin film resistor |
Pinghai Hao, Fuchao Wang |
2016-04-05 |
| 7511350 |
Nickel alloy silicide including indium and a method of manufacture therefor |
Peijun Chen, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul |
2009-03-31 |
| 7422968 |
Method for manufacturing a semiconductor device having silicided regions |
Jiong-Ping Lu, Clint Montgomery, Lindsey Hall, Donald Miles, Thomas D. Bonifiield |
2008-09-09 |
| 7397046 |
Method for implanter angle verification and calibration |
Jeffrey Loewecke, Jiejie Xu, Thomas Patrick Conroy |
2008-07-08 |
| 7355255 |
Nickel silicide including indium and a method of manufacture therefor |
Peijun Chen, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul |
2008-04-08 |
| 7344985 |
Nickel alloy silicide including indium and a method of manufacture therefor |
Peijun Chen, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul |
2008-03-18 |
| 7256121 |
Contact resistance reduction by new barrier stack process |
Stephan Grunow, Satyavolu Srinivas Papa Rao, Noel Russell, Montray Leavy |
2007-08-14 |
| 7211516 |
Nickel silicide including indium and a method of manufacture therefor |
Peijun Chen, Amitabh Jain, Sue Crank, Thomas D. Bonifield, Homi Mogul |
2007-05-01 |
| 7208398 |
Metal-halogen physical vapor deposition for semiconductor device defect reduction |
Peijun Chen, Douglas E. Mercer, Noel Russell |
2007-04-24 |
| 7208409 |
Integrated circuit metal silicide method |
Jiong-Ping Lu, Xiaozhan Liu, Donald Miles, Lance Robertson |
2007-04-24 |
| 7199032 |
Metal silicide induced lateral excessive encroachment reduction by silicon <110> channel stuffing |
Peijun Chen, Sue Crank, Thomas D. Bonifield, Jiong-Ping Lu, Jie Xu |
2007-04-03 |
| 7029967 |
Silicide method for CMOS integrated circuits |
Song Zhao, Sue Crank, Amitava Chatterjee, Kaiping Liu, Jiong-Ping Lu +2 more |
2006-04-18 |