Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11217448 | Methods for reducing transfer pattern defects in a semiconductor device | Regina Freed, Nadine Alexis, Lin Zhou | 2022-01-04 |
| 10971368 | Techniques for processing substrates using directional reactive ion etching | Simon Ruffell, John Hautala, Adam Brand | 2021-04-06 |
| 10777414 | Methods for reducing transfer pattern defects in a semiconductor device | Regina Freed, Nadine Alexis, Lin Zhou | 2020-09-15 |
| 10629437 | Techniques and structure for forming dynamic random-access device using angled ions | Sony Varghese, John Hautala, Rajesh Prasad, Min Gyu Sung | 2020-04-21 |
| 10332748 | Etch rate modulation through ion implantation | Rajesh Prasad, Andrew Waite, Sungho Jo, Kyu-Ha Shim, Guy Oteri +1 more | 2019-06-25 |
| 10310379 | Multiple patterning approach using ion implantation | Tristan Y. Ma, Maureen Petterson, John Hautala | 2019-06-04 |
| 10229832 | Techniques for forming patterned features using directional ions | John Hautala, Simon Ruffell | 2019-03-12 |
| 10204909 | Non-uniform gate oxide thickness for DRAM device | Simon Ruffell, Arvind Kumar, Tristan Y. Ma, Kyu-Ha Shim, John Hautala | 2019-02-12 |
| 9934981 | Techniques for processing substrates using directional reactive ion etching | Simon Ruffell, John Hautala, Adam Brand | 2018-04-03 |
| 9934982 | Etch rate modulation through ion implantation | Rajesh Prasad, Andrew Waite, Sungho Jo, Kyu-Ha Shim, Guy Oteri +1 more | 2018-04-03 |
| 9728623 | Replacement metal gate transistor | Ying Zhang | 2017-08-08 |
| 9613813 | Method for improving critical dimension variability by implanting argon or silicon ions into a patterned mask | Todd Henry | 2017-04-04 |
| 9153444 | Process flow for replacement metal gate transistors | Ying Zhang | 2015-10-06 |
| 9082949 | Magnetic memory and method of fabrication | Alexander C. Kontos, John Hautala, Simon Ruffell | 2015-07-14 |
| 8946836 | Magnetic memory and method of fabrication | Alexander C. Kontos, John Hautala, Simon Ruffell | 2015-02-03 |
| 8192805 | Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices | Noel Russell, John Hautala | 2012-06-05 |
| 7981483 | Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices | Noel Russell, John Hautala | 2011-07-19 |
| 7838423 | Method of forming capping structures on one or more material layer surfaces | Arthur J. Learn, Robert M. Geffken, John Hautala | 2010-11-23 |
| 7799683 | Copper interconnect wiring and method and apparatus for forming thereof | Arthur J. Learn, Robert M. Geffken, John Hautala | 2010-09-21 |
| 7754588 | Method to improve a copper/dielectric interface in semiconductor devices | Noel Russell, John Hautala | 2010-07-13 |
| 7291558 | Copper interconnect wiring and method of forming thereof | Robert M. Geffken, John Hautala, Arthur J. Learn | 2007-11-06 |
| 6919061 | In-situ method for treating residual sodium | S. Paul Henslee | 2005-07-19 |