Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11574800 | Extreme edge uniformity control | Alexandre Likhanskii, John Hautala, Anthony Renau, Christopher A. Rowland, Costel Biloiu | 2023-02-07 |
| 11324973 | Multi-color charged particle detector apparatus and method of use thereof | W. Davis Lee | 2022-05-10 |
| 11053580 | Techniques for selective deposition using angled ions | Kevin Anglin | 2021-07-06 |
| 11000705 | Relativistic energy compensating cancer therapy apparatus and method of use thereof | W. Davis Lee | 2021-05-11 |
| 10898732 | Multi-color charged particle detector apparatus and method of use thereof | W. Davis Lee | 2021-01-26 |
| 10665433 | Extreme edge uniformity control | Alexandre Likhanskii, John Hautala, Anthony Renau, Christopher A. Rowland, Costel Biloiu | 2020-05-26 |
| 10532228 | Multi-color charged particle detector apparatus and method of use thereof | W. Davis Lee | 2020-01-14 |
| 10310379 | Multiple patterning approach using ion implantation | Tristan Y. Ma, John Hautala, Steven R. Sherman | 2019-06-04 |
| 9885957 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Tristan Y. Ma, John Hautala | 2018-02-06 |
| 9735013 | Ion implantation for improved contact hole critical dimension uniformity | Tristan Y. Ma, John Hautala, Boya Cui | 2017-08-15 |
| 9659784 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Tristan Y. Ma, John Hautala | 2017-05-23 |
| 9520290 | Ion implantation for improved etch performance | Tristan Y. Ma | 2016-12-13 |
| 9512517 | Multiple exposure treatment for processing a patterning feature | Tristan Y. Ma, John Hautala, Ludovic Godet | 2016-12-06 |