Issued Patents All Time
Showing 1–25 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249488 | Plasma shaper to control ion flux distribution of plasma source | Peter F. Kurunczi, Alan V. Hayes | 2025-03-11 |
| 12154753 | Device to control uniformity of extracted ion beam | Jay T. Scheuer, Graham Wright, Peter F. Kurunczi | 2024-11-26 |
| D1051838 | Single-slot tubular cathode | Bon-Woong Koo, Frank Sinclair, Svetlana B. Radovanov, Alexander S. Perel, Graham Wright +6 more | 2024-11-19 |
| 12125680 | Ion extraction assembly having variable electrode thickness for beam uniformity control | Alan V. Hayes, Dmitry Lubomirsky | 2024-10-22 |
| 11810746 | Variable thickness ion source extraction plate | Alexander S. Perel, Jay T. Scheuer, Bon-Woong Koo, Robert C. Lindberg, Peter F. Kurunczi +1 more | 2023-11-07 |
| 11791126 | Apparatus for directional processing | — | 2023-10-17 |
| 11651932 | Mismatched optics for angular control of extracted ion beam | Jay T. Scheuer, Sudhakar Mahalingam, Nevin H. Clay | 2023-05-16 |
| 11631567 | Ion source with single-slot tubular cathode | Bon-Woong Koo, Frank Sinclair, Svetlana B. Radovanov, Alexander S. Perel, Graham Wright +6 more | 2023-04-18 |
| 11600473 | Ion source with biased extraction plate | Svetlana B. Radovanov, Bon-Woong Koo | 2023-03-07 |
| 11587778 | Electrodynamic mass analysis with RF biased ion source | Joseph C. Olson, Frank Sinclair, Peter F. Kurunczi | 2023-02-21 |
| 11574800 | Extreme edge uniformity control | Maureen Petterson, John Hautala, Anthony Renau, Christopher A. Rowland, Costel Biloiu | 2023-02-07 |
| 11495434 | In-situ plasma cleaning of process chamber components | Kevin Anglin, William Davis Lee, Peter F. Kurunczi, Ryan Downey, Jay T. Scheuer +1 more | 2022-11-08 |
| 11437215 | Electrostatic filter providing reduced particle generation | Antonella Cucchetti, Eric D. Hermanson, Frank Sinclair, Jay T. Scheuer, Robert C. Lindberg | 2022-09-06 |
| D956005 | Shaped electrode | Robert C. Lindberg, Wayne LeBlanc, Frank Sinclair, Svetlana B. Radovanov | 2022-06-28 |
| 11127557 | Ion source with single-slot tubular cathode | Bon-Woong Koo, Frank Sinclair, Svetlana B. Radovanov, Alexander S. Perel, Graham Wright +6 more | 2021-09-21 |
| 11037758 | In-situ plasma cleaning of process chamber components | Kevin Anglin, William Davis Lee, Peter F. Kurunczi, Ryan Downey, Jay T. Scheuer +1 more | 2021-06-15 |
| 11011343 | High-current ion implanter and method for controlling ion beam using high-current ion implanter | Shengwu Chang, Frank Sinclair, Antonella Cucchetti, Eric D. Hermanson, Christopher Campbell | 2021-05-18 |
| 10937624 | Apparatus and method for controlling ion beam using electrostatic filter | Frank Sinclair, Shengwu Chang | 2021-03-02 |
| 10923306 | Ion source with biased extraction plate | Svetlana B. Radovanov, Bon-Woong Koo | 2021-02-16 |
| 10886098 | Electrostatic filter and ion implanter having asymmetric electrostatic configuration | Frank Sinclair, Shengwu Chang, Eric D. Hermanson, Nevin H. Clay | 2021-01-05 |
| 10804068 | Electostatic filter and method for controlling ion beam properties using electrostatic filter | Frank Sinclair, Shengwu Chang | 2020-10-13 |
| 10790116 | Electostatic filter and method for controlling ion beam using electostatic filter | Frank Sinclair, Shengwu Chang | 2020-09-29 |
| 10763072 | Apparatus, system and techniques for mass analyzed ion beam | Frank Sinclair, Costel Biloiu, Joseph C. Olson | 2020-09-01 |
| 10714301 | Conductive beam optics for reducing particles in ion implanter | Shengwu Chang, Frank Sinclair, Christopher Campbell, Robert C. Lindberg | 2020-07-14 |
| 10665433 | Extreme edge uniformity control | Maureen Petterson, John Hautala, Anthony Renau, Christopher A. Rowland, Costel Biloiu | 2020-05-26 |