PK

Peter F. Kurunczi

VA Varian Semiconductor Equipment Associates: 26 patents #22 of 513Top 5%
Applied Materials: 13 patents #1,030 of 7,310Top 15%
TT Trustees Of The Stevens Institute Of Technology: 1 patents #122 of 304Top 45%
📍 Cambridge, MA: #148 of 8,183 inventorsTop 2%
🗺 Massachusetts: #1,352 of 88,656 inventorsTop 2%
Overall (All Time): #59,074 of 4,157,543Top 2%
47
Patents All Time

Issued Patents All Time

Showing 1–25 of 47 patents

Patent #TitleCo-InventorsDate
12249488 Plasma shaper to control ion flux distribution of plasma source Alexandre Likhanskii, Alan V. Hayes 2025-03-11
12191156 Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic deposition of thin films John Hautala, Tristan Y. Ma 2025-01-07
12154753 Device to control uniformity of extracted ion beam Jay T. Scheuer, Graham Wright, Alexandre Likhanskii 2024-11-26
12106936 Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions Morgan Evans, Joseph C. Olson, Christopher A. Rowland, James P. Buonodono 2024-10-01
11996266 Apparatus and techniques for substrate processing using independent ion source and radical source Anthony Renau, Joseph C. Olson 2024-05-28
11967489 Apparatus and techniques for angled etching using multielectrode extraction source Morgan Evans, Joseph C. Olson 2024-04-23
11948781 Apparatus and system including high angle extraction optics Christopher Campbell, Costel Biloiu, Jay Wallace, Kevin M. Daniels, Kevin T. Ryan +3 more 2024-04-02
11862433 System and methods using an inline surface engineering source Christopher R. Hatem, Christopher A. Rowland, Joseph C. Olson, Anthony Renau 2024-01-02
11810746 Variable thickness ion source extraction plate Alexandre Likhanskii, Alexander S. Perel, Jay T. Scheuer, Bon-Woong Koo, Robert C. Lindberg +1 more 2023-11-07
11715621 Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions Morgan Evans, Joseph C. Olson, Christopher A. Rowland, James P. Buonodono 2023-08-01
11662524 Forming variable depth structures with laser ablation Joseph C. Olson, Morgan Evans, Rutger Meyer Timmerman Thijssen 2023-05-30
11587778 Electrodynamic mass analysis with RF biased ion source Alexandre Likhanskii, Joseph C. Olson, Frank Sinclair 2023-02-21
11495434 In-situ plasma cleaning of process chamber components Kevin Anglin, William Davis Lee, Ryan Downey, Jay T. Scheuer, Alexandre Likhanskii +1 more 2022-11-08
11388810 System, apparatus and method for multi-frequency resonator operation in linear accelerator David Blahnik, Frank Sinclair 2022-07-12
11195703 Apparatus and techniques for angled etching using multielectrode extraction source Morgan Evans, Joseph C. Olson 2021-12-07
11069511 System and methods using an inline surface engineering source Christopher R. Hatem, Christopher A. Rowland, Joseph C. Olson, Anthony Renau 2021-07-20
11037758 In-situ plasma cleaning of process chamber components Kevin Anglin, William Davis Lee, Ryan Downey, Jay T. Scheuer, Alexandre Likhanskii +1 more 2021-06-15
10522330 In-situ plasma cleaning of process chamber components Kevin Anglin, William Davis Lee, Ryan Downey, Jay T. Scheuer, Alexandre Likhanskii +1 more 2019-12-31
10410844 RF clean system for electrostatic elements Kevin Anglin, Brant S. Binns, Jay T. Scheuer, Eric D. Hermanson, Alexandre Likhanskii 2019-09-10
10290466 Boron implanting using a co-gas Bon-Woong Koo, Vikram M. Bhosle, John A. Frontiero, Nicholas P. T. Bateman, Timothy J. Miller +3 more 2019-05-14
10224181 Radio frequency extraction system for charge neutralized ion beam Costel Biloiu, Piotr Lubicki, Tyler Rockwell, Christopher Campbell, Vikram Singh +3 more 2019-03-05
10192727 Electrodynamic mass analysis Frank Sinclair, Joseph C. Olson, Costel Biloiu, Alexandre Likhanskii 2019-01-29
9865430 Boron implanting using a co-gas Bon-Woong Koo, Vikram M. Bhosle, John A. Frontiero, Nicholas P. T. Bateman, Timothy J. Miller +3 more 2018-01-09
9711316 Method of cleaning an extraction electrode assembly using pulsed biasing Christopher J. Leavitt 2017-07-18
9536712 Apparatus and method for mass analyzed ion beam W. Davis Lee, Svetlana B. Radovanov 2017-01-03