| 12106943 |
Substrate halo arrangement for improved process uniformity |
Jay Wallace, Simon Ruffell, Kevin Anglin, Tyler Rockwell, Christopher Campbell +2 more |
2024-10-01 |
| 11948781 |
Apparatus and system including high angle extraction optics |
Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay Wallace, Kevin M. Daniels +3 more |
2024-04-02 |
| 10925146 |
Ion source chamber with embedded heater |
Todd Lewis MacEachern, Jeffrey E. Krampert, Joseph P. Dzengeleski |
2021-02-16 |
| 6794664 |
Umbilical cord facilities connection for an ion beam implanter |
Robert J. Mitchell |
2004-09-21 |
| 6429139 |
Serial wafer handling mechanism |
Peter L. Kellerman, Frank Sinclair, Ernest E. Allen, Roger B. Fish |
2002-08-06 |
| 6347919 |
Wafer processing chamber having separable upper and lower halves |
Peter L. Kellerman, Frank Sinclair, Ernest E. Allen, Roger B. Fish |
2002-02-19 |
| 6305316 |
Integrated power oscillator RF source of plasma immersion ion implantation system |
William F. DiVergilio, Peter L. Kellerman |
2001-10-23 |
