Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8530247 | Control of implant pattern critical dimensions using STI step height offset | Brian Douglas Reid, Hongyu Yue, Howie Hui Yang, Mark Boehm | 2013-09-10 |
| 7883909 | Method to measure ion beam angle | — | 2011-02-08 |
| 7807978 | Divergent charged particle implantation for improved transistor symmetry | Lance Robertson, Said Ghneim, Jiejie Xu, Jeffrey Loewecke | 2010-10-05 |
| 7385202 | Divergent charged particle implantation for improved transistor symmetry | Lance Robertson, Said Ghneim, Jiejie Xu, Jeffrey Loewecke | 2008-06-10 |
| 7253072 | Implant optimization scheme | Lance Robertson, Said Ghneim, Nandu Mahalingam, Benjamin G. Moser | 2007-08-07 |
| 7232744 | Method for implanting dopants within a substrate by tilting the substrate relative to the implant source | Said Ghneim, Lance Robertson, Jiejie Xu, Jeffrey Loewecke | 2007-06-19 |
| 7208330 | Method for varying the uniformity of a dopant as it is placed in a substrate by varying the speed of the implant across the substrate | Sean Collins, Jeffrey Loewecke | 2007-04-24 |
| 6458430 | Pretreatment process for plasma immersion ion implantation | Peter L. Kellerman, Alec S. Denholm | 2002-10-01 |
| 6237527 | System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate | Peter L. Kellerman, A. Stuart Denholm | 2001-05-29 |
| 6221169 | System and method for cleaning contaminated surfaces in an ion implanter | Peter M. Kopalidis, Brian S. Freer | 2001-04-24 |
| 5909031 | Ion implanter electron shower having enhanced secondary electron emission | Peter L. Kellerman, Brian S. Freer | 1999-06-01 |
| 5903009 | Biased and serrated extension tube for ion implanter electron shower | Brian S. Freer, Peter L. Kellerman | 1999-05-11 |