| 8530247 |
Control of implant pattern critical dimensions using STI step height offset |
Brian Douglas Reid, Hongyu Yue, Howie Hui Yang, Mark Boehm |
2013-09-10 |
| 7883909 |
Method to measure ion beam angle |
— |
2011-02-08 |
| 7807978 |
Divergent charged particle implantation for improved transistor symmetry |
Lance Robertson, Said Ghneim, Jiejie Xu, Jeffrey Loewecke |
2010-10-05 |
| 7385202 |
Divergent charged particle implantation for improved transistor symmetry |
Lance Robertson, Said Ghneim, Jiejie Xu, Jeffrey Loewecke |
2008-06-10 |
| 7253072 |
Implant optimization scheme |
Lance Robertson, Said Ghneim, Nandu Mahalingam, Benjamin G. Moser |
2007-08-07 |
| 7232744 |
Method for implanting dopants within a substrate by tilting the substrate relative to the implant source |
Said Ghneim, Lance Robertson, Jiejie Xu, Jeffrey Loewecke |
2007-06-19 |
| 7208330 |
Method for varying the uniformity of a dopant as it is placed in a substrate by varying the speed of the implant across the substrate |
Sean Collins, Jeffrey Loewecke |
2007-04-24 |
| 6458430 |
Pretreatment process for plasma immersion ion implantation |
Peter L. Kellerman, Alec S. Denholm |
2002-10-01 |
| 6237527 |
System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate |
Peter L. Kellerman, A. Stuart Denholm |
2001-05-29 |
| 6221169 |
System and method for cleaning contaminated surfaces in an ion implanter |
Peter M. Kopalidis, Brian S. Freer |
2001-04-24 |
| 5909031 |
Ion implanter electron shower having enhanced secondary electron emission |
Peter L. Kellerman, Brian S. Freer |
1999-06-01 |
| 5903009 |
Biased and serrated extension tube for ion implanter electron shower |
Brian S. Freer, Peter L. Kellerman |
1999-05-11 |