Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10672596 | Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source | — | 2020-06-02 |
| 10431425 | Poly-phased inductively coupled plasma source | — | 2019-10-01 |
| 10413913 | Methods and systems for dielectrophoresis (DEP) separation | — | 2019-09-17 |
| 10066293 | Method of cleaning the filament and reactor's interior in FACVD | Osayuki Akiyama | 2018-09-04 |
| 9228261 | System and method for tissue construction using an electric field applicator | — | 2016-01-05 |
| 8916055 | Method and device for controlling pattern and structure formation by an electric field | Jacques Faguet, Eric M. Lee, Hongyu Yue | 2014-12-23 |
| 8715455 | Multi-zone gas distribution system for a treatment system | — | 2014-05-06 |
| 8480914 | Multiple gas plasma forming method and ICP source | — | 2013-07-09 |
| 8409398 | Control of ion angular distribution function at wafer surface | — | 2013-04-02 |
| 8103492 | Plasma fluid modeling with transient to stochastic transformation | — | 2012-01-24 |
| 8092658 | Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process | — | 2012-01-10 |
| 8028655 | Plasma processing system with locally-efficient inductive plasma coupling | Rodney L. Robison | 2011-10-04 |
| 7976674 | Embedded multi-inductive large area plasma source | — | 2011-07-12 |
| 7867409 | Control of ion angular distribution function at wafer surface | — | 2011-01-11 |
| 7854213 | Modulated gap segmented antenna for inductively-coupled plasma processing system | — | 2010-12-21 |
| 7810449 | Plasma processing system with locally-efficient inductive plasma coupling | Rodney L. Robison | 2010-10-12 |
| 7776748 | Selective-redeposition structures for calibrating a plasma process | Rodney L. Robison, Takashi Horiuchi | 2010-08-17 |
| 7771562 | Etch system with integrated inductive coupling | — | 2010-08-10 |
| 7763551 | RLSA CVD deposition control using halogen gas for hydrogen scavenging | Song yun Kang, Toshio Nakanishi, Peter L. G. Ventzek, Minoru Honda, Masayuki Kohno | 2010-07-27 |
| 7749398 | Selective-redeposition sources for calibrating a plasma process | Rodney L. Robison, Takashi Horiuchi | 2010-07-06 |
| 7744735 | Ionized PVD with sequential deposition and etching | Rodney L. Robison, Jacques Faguet, Bruce Gittleman, Tugrul Yasar, Frank M. Cerio, Jr. | 2010-06-29 |
| 7673583 | Locally-efficient inductive plasma coupling for plasma processing system | — | 2010-03-09 |
| 7651570 | Solid precursor vaporization system for use in chemical vapor deposition | — | 2010-01-26 |
| 7591935 | Enhanced reliability deposition baffle for iPVD | Rodney L. Robison | 2009-09-22 |
| 7566477 | Method for saturating a carrier gas with precursor vapor | — | 2009-07-28 |