Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12341053 | System for backside deposition of a substrate | Ronald Nasman, Gerrit J. Leusink, Hoyoung Kang, Daniel Fulford | 2025-06-24 |
| 11908728 | System for backside deposition of a substrate | Ronald Nasman, Gerrit J. Leusink, Hoyoung Kang, Daniel Fulford | 2024-02-20 |
| 11383211 | Point-of-use dynamic concentration delivery system with high flow and high uniformity | Ronald Nasman, Lior Huli, Anton J. deVilliers, Norman A. Jacobson, Jr., James Grootegoed | 2022-07-12 |
| 10426001 | Processing system for electromagnetic wave treatment of a substrate at microwave frequencies | Ronald Nasman, Mirko Vukovic, Gerrit J. Leusink, Robert D. Clark | 2019-09-24 |
| 10403501 | High-purity dispense system | Anton J. deVilliers, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, Jr. +2 more | 2019-09-03 |
| 10354872 | High-precision dispense system with meniscus control | Anton J. deVilliers, Ronald Nasman, David Travis, James Grootegoed, Norman A. Jacobson, Jr. +3 more | 2019-07-16 |
| 8194384 | High temperature electrostatic chuck and method of using | Ronald Nasman, Toshiaki Fujisato | 2012-06-05 |
| 8028655 | Plasma processing system with locally-efficient inductive plasma coupling | Jozef Brcka | 2011-10-04 |
| 7901545 | Ionized physical vapor deposition (iPVD) process | Frank M. Cerio, Jr., Jacques Faguet, Bruce Gittleman | 2011-03-08 |
| 7810449 | Plasma processing system with locally-efficient inductive plasma coupling | Jozef Brcka | 2010-10-12 |
| 7776748 | Selective-redeposition structures for calibrating a plasma process | Jozef Brcka, Takashi Horiuchi | 2010-08-17 |
| 7772110 | Electrical contacts for integrated circuits and methods of forming using gas cluster ion beam processing | Douglas M. Trickett | 2010-08-10 |
| 7749398 | Selective-redeposition sources for calibrating a plasma process | Jozef Brcka, Takashi Horiuchi | 2010-07-06 |
| 7744735 | Ionized PVD with sequential deposition and etching | Jacques Faguet, Bruce Gittleman, Tugrul Yasar, Frank M. Cerio, Jr., Jozef Brcka | 2010-06-29 |
| 7591935 | Enhanced reliability deposition baffle for iPVD | Jozef Brcka | 2009-09-22 |
| 7273533 | Plasma processing system with locally-efficient inductive plasma coupling | Jozef Brcka | 2007-09-25 |
| 6755945 | Ionized PVD with sequential deposition and etching | Tugrul Yasar, Glyn Reynolds, Frank M. Cerio, Jr., Bruce Gittleman, Michael Grapperhaus | 2004-06-29 |
| 6183615 | Transport system for wafer processing line | Tugrul Yasar, Daniel Deyo, Marian Zielinski | 2001-02-06 |
| 5408322 | Self aligning in-situ ellipsometer and method of using for process monitoring | Jon Hsu, Bhola De, Tugrul Yasar | 1995-04-18 |