MV

Mirko Vukovic

TL Tokyo Electron Limited: 27 patents #155 of 5,567Top 3%
📍 Slingerlands, NY: #16 of 96 inventorsTop 20%
🗺 New York: #4,646 of 115,490 inventorsTop 5%
Overall (All Time): #143,363 of 4,157,543Top 4%
27
Patents All Time

Issued Patents All Time

Showing 1–25 of 27 patents

Patent #TitleCo-InventorsDate
12105423 Apparatus and methods for beam processing of substrates 2024-10-01
12007689 Apparatus and method for spin processing Steven Gueci 2024-06-11
11883837 System and method for liquid dispense and coverage control Daniel Fulford, Anton J. deVilliers 2024-01-30
11049700 Atmospheric plasma processing systems and methods for manufacture of microelectronic workpieces Anton J. deVilliers, Brandon Byrns 2021-06-29
10522384 Electromagnetic wave treatment of a substrate at microwave frequencies using a wave resonator 2019-12-31
10426001 Processing system for electromagnetic wave treatment of a substrate at microwave frequencies Ronald Nasman, Gerrit J. Leusink, Rodney L. Robison, Robert D. Clark 2019-09-24
10256121 Heated stage with variable thermal emissivity method and apparatus Ronald Nasman 2019-04-09
10215704 Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing Taejoon Han, Daniel Morvay 2019-02-26
8568555 Method and apparatus for reducing substrate temperature variability Kenji Suzuki 2013-10-29
8435351 Method and system for measuring a flow rate in a solid precursor delivery system 2013-05-07
8252114 Gas distribution system and method for distributing process gas in a processing system 2012-08-28
8048226 Method and system for improving deposition uniformity in a vapor deposition system James Grootegoed 2011-11-01
7959775 Thermal stress-failure-resistant dielectric windows in vacuum processing systems Ronald Nasman 2011-06-14
7691243 Internal antennae for plasma processing with metal plasma 2010-04-06
7591232 Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith 2009-09-22
7537671 Self-calibrating optical emission spectroscopy for plasma monitoring 2009-05-26
7314537 Method and apparatus for detecting a plasma Craig T. Baldwin, Carl M. Spearow 2008-01-01
7315128 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition Derrek Andrew Russell 2008-01-01
7255774 Process apparatus and method for improving plasma production of an inductively coupled plasma Edward L. Sill 2007-08-14
7084573 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition Derrek Andrew Russell 2006-08-01
6771026 Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave 2004-08-03
6719886 Method and apparatus for ionized physical vapor deposition John Drewery, Glyn Reynolds, Derrek Andrew Russell, Jozef Brcka, Michael Grapperhaus +2 more 2004-04-13
6652711 Inductively-coupled plasma processing system Jozef Brcka, John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds +1 more 2003-11-25
6417626 Immersed inductively—coupled plasma source Jozef Brcka, John Drewery, Michael Grapperhaus, Gerrit J. Leusink, Glyn Reynolds +1 more 2002-07-09
6287435 Method and apparatus for ionized physical vapor deposition John Drewery, Glyn Reynolds, Derrek Andrew Russell, Jozef Brcka, Michael Grapperhaus +2 more 2001-09-11