Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7255774 | Process apparatus and method for improving plasma production of an inductively coupled plasma | Mirko Vukovic | 2007-08-14 |
| 6596550 | Method for monitoring substrate biasing during plasma processing of a substrate | William Jones, Craig T. Baldwin | 2003-07-22 |
| 6577113 | Apparatus and method for measuring substrate biasing during plasma processing of a substrate | William Jones, Craig T. Baldwin | 2003-06-10 |
| 6431112 | Apparatus and method for plasma processing of a substrate utilizing an electrostatic chuck | William Jones, Craig T. Baldwin | 2002-08-13 |
| 6395095 | Process apparatus and method for improved plasma processing of a substrate | William Jones, Robert Rowan, Thomas J. Licata | 2002-05-28 |
| 6367413 | Apparatus for monitoring substrate biasing during plasma processing of a substrate | William Jones, Craig T. Baldwin | 2002-04-09 |
| 6284110 | Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines | — | 2001-09-04 |
| 6248251 | Apparatus and method for electrostatically shielding an inductively coupled RF plasma source and facilitating ignition of a plasma | — | 2001-06-19 |
| 6214720 | Plasma process enhancement through reduction of gaseous contaminants | Thomas J. Licata | 2001-04-10 |
| 6130159 | Apparatus and methods for minimizing as-deposited stress in tungsten silicide films | Sien G. Kang, John Y. Adachi, David Badt, Hector Velasco | 2000-10-10 |
| 5963836 | Methods for minimizing as-deposited stress in tungsten silicide films | Sien G. Kang, John Y. Adachi, David Badt, Hector Velasco | 1999-10-05 |
| 4803173 | Method of fabrication of semiconductor device having a planar configuration | Paul G. Hilton | 1989-02-07 |