Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406887 | Selective film formation using a self-assembled monolayer | Dina H. Triyoso, Corey Lemley, Robert D. Clark, Gerrit J. Leusink | 2025-09-02 |
| 12393121 | Point-of-use blending of rinse solutions for EUV processing to mitigate pattern collapse | Naoki Shibata | 2025-08-19 |
| 12216400 | Directed self-assembly | Richard A. Farrell | 2025-02-04 |
| 12193231 | Fabricating three-dimensional semiconductor structures | Soo Doo Chae, Karthikeyan Pillai, Na Young Bae, Hojin Kim | 2025-01-07 |
| 12080599 | Methods for forming self-aligned contacts using spin-on silicon carbide | Junling Sun, Andrew Metz, Angelique Raley | 2024-09-03 |
| 11762297 | Point-of-use blending of rinse solutions to mitigate pattern collapse | Naoki Shibata | 2023-09-19 |
| 11482454 | Methods for forming self-aligned contacts using spin-on silicon carbide | Junling Sun, Andrew Metz, Angelique Raley | 2022-10-25 |
| 11383211 | Point-of-use dynamic concentration delivery system with high flow and high uniformity | Ronald Nasman, Anton J. deVilliers, Rodney L. Robison, Norman A. Jacobson, Jr., James Grootegoed | 2022-07-12 |
| 11243465 | Plasma treatment method to enhance surface adhesion for lithography | Wanjae Park, Soo Doo Chae | 2022-02-08 |
| 10935889 | Extreme ultra-violet sensitivity reduction using shrink and growth method | Nihar Mohanty | 2021-03-02 |
| 10770294 | Selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance | David L. O'Meara, Soo Doo Chae, Wan Jae Park | 2020-09-08 |
| 10685857 | Dispense nozzle with a shielding device | Ronald Nasman | 2020-06-16 |
| 10403501 | High-purity dispense system | Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed +2 more | 2019-09-03 |
| 10354872 | High-precision dispense system with meniscus control | Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed +3 more | 2019-07-16 |
| 10141183 | Methods of spin-on deposition of metal oxides | Nihar Mohanty, Jeffrey Smith, Richard A. Farrell | 2018-11-27 |
| 9991133 | Method for etch-based planarization of a substrate | Cheryl Pereira, Nihar Mohanty | 2018-06-05 |
| 9791779 | EUV resist etch durability improvement and pattern collapse mitigation | — | 2017-10-17 |
| 9711419 | Substrate backside texturing | Carlos A. Fonseca, Benjamen M. Rathsack, Jeffrey Smith, Anton J. deVilliers, Teruhiko Kodama +1 more | 2017-07-18 |
| 9281251 | Substrate backside texturing | Carlos A. Fonseca, Anton J. deVilliers, Benjamen M. Rathsack, Jeffrey Smith | 2016-03-08 |
| 9086631 | EUV resist sensitivity reduction | David Hetzer | 2015-07-21 |
| 8975009 | Track processing to remove organic films in directed self-assembly chemo-epitaxy applications | Mark H. Somervell, David Hetzer | 2015-03-10 |