Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12165870 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Steven Scheer, Michael A. Carcasi, Mark H. Somervell, Joshua Hooge | 2024-12-10 |
| 10622267 | Facilitation of spin-coat planarization over feature topography during substrate fabrication | Ryan L. Burns, Mark H. Somervell, Makoto Muramatsu | 2020-04-14 |
| 10534266 | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes | Michael A. Carcasi, Joshua Hooge, Seiji Nagahara | 2020-01-14 |
| 10429745 | Photo-sensitized chemically amplified resist (PS-CAR) simulation | Michael A. Carcasi, Mark H. Somervell, Wallace P. Printz, Seiji Nagahara, Seiichi Tagawa | 2019-10-01 |
| 10170354 | Subtractive methods for creating dielectric isolation structures within open features | Mark H. Somervell | 2019-01-01 |
| 10020195 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Steven Scheer, Michael A. Carcasi, Mark H. Somervell, Joshua Hooge | 2018-07-10 |
| 9793137 | Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines | Mark H. Somervell | 2017-10-17 |
| 9735026 | Controlling cleaning of a layer on a substrate using nozzles | Ian J. Brown, Wallace P. Printz | 2017-08-15 |
| 9715172 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell | 2017-07-25 |
| 9711419 | Substrate backside texturing | Carlos A. Fonseca, Jeffrey Smith, Anton J. deVilliers, Lior Huli, Teruhiko Kodama +1 more | 2017-07-18 |
| 9633847 | Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition | Mark H. Somervell | 2017-04-25 |
| 9618848 | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes | Michael A. Carcasi, Joshua Hooge, Seiji Nagahara | 2017-04-11 |
| 9613801 | Integration of absorption based heating bake methods into a photolithography track system | Michael A. Carcasi, Mark H. Somervell | 2017-04-04 |
| 9519227 | Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) | Michael A. Carcasi, Mark H. Somervell, Joshua Hooge, Seiji Nagahara | 2016-12-13 |
| 9454081 | Line pattern collapse mitigation through gap-fill material application | Mark H. Somervell, Ian J. Brown, Steven Scheer, Joshua Hooge | 2016-09-27 |
| 9418860 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell, Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Hidetami Yaegashi +1 more | 2016-08-16 |
| 9412611 | Use of grapho-epitaxial directed self-assembly to precisely cut lines | Mark H. Somervell | 2016-08-09 |
| 9349604 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell | 2016-05-24 |
| 9281251 | Substrate backside texturing | Carlos A. Fonseca, Anton J. deVilliers, Jeffrey Smith, Lior Huli | 2016-03-08 |
| 9209014 | Multi-step bake apparatus and method for directed self-assembly lithography control | — | 2015-12-08 |
| 9147574 | Topography minimization of neutral layer overcoats in directed self-assembly applications | Mark H. Somervell | 2015-09-29 |
| 9136110 | Multi-step bake apparatus and method for directed self-assembly lithography control | — | 2015-09-15 |
| 9005877 | Method of forming patterns using block copolymers and articles thereof | Mark H. Somervell, Meenakshisundaram Gandhi | 2015-04-14 |
| 8795952 | Line pattern collapse mitigation through gap-fill material application | Mark H. Somervell, Ian J. Brown, Steven Scheer, Joshua Hooge | 2014-08-05 |
| 8318607 | Immersion lithography wafer edge bead removal for wafer and scanner defect prevention | Mark H. Somervell | 2012-11-27 |