Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11796919 | Resist pattern formation method | — | 2023-10-24 |
| 11187984 | Resist patterning method and resist material | — | 2021-11-30 |
| 10670967 | Resist patterning method, latent resist image forming device, resist patterning device, and resist material | Akihiro Oshima | 2020-06-02 |
| 10429745 | Photo-sensitized chemically amplified resist (PS-CAR) simulation | Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell, Wallace P. Printz, Seiji Nagahara | 2019-10-01 |
| 10073349 | Chemically amplified resist material, pattern-forming method, compound, and production method of compound | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10073348 | Resist-pattern-forming method and chemically amplified resist material | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Akihiro Oshima, Seiji Nagahara | 2018-09-11 |
| 10025187 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | Seiji Nagahara, Akihiro Oshima | 2018-07-17 |
| 10025190 | Substrate treatment system | Seiji Nagahara, Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Shinichiro KAWAKAMI +2 more | 2018-07-17 |
| 9977332 | Resist patterning method, latent resist image forming device, resist patterning device, and resist material | Akihiro Oshima | 2018-05-22 |
| 9971247 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Akihiro Oshima, Seiji Nagahara | 2018-05-15 |
| 7731927 | Ceramic nanowires and a process for producing them by ion beam irradiation | Masaki Sugimoto, Masahito Yoshikawa, Shuhei Seki, Satoshi Tsukuda | 2010-06-08 |
| 7354637 | Damper and process thereof | Mikihito Ogawa | 2008-04-08 |
| 6984432 | Damper and process thereof | Mikihito Ogawa | 2006-01-10 |