Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12298668 | Heat treatment apparatus and heat treatment method | Yohei SANO, Tomoya ONITSUKA | 2025-05-13 |
| 12002676 | Method for forming mask pattern, storage medium, and apparatus for processing substrate | Takashi Yamauchi, Masashi Enomoto | 2024-06-04 |
| 11604415 | Substrate processing method, substrate processing apparatus, and computer readable recording medium | Takashi Yamauchi, Masashi Enomoto | 2023-03-14 |
| 11508580 | Method for forming mask pattern, storage medium, and apparatus for processing substrate | Takashi Yamauchi, Masashi Enomoto | 2022-11-22 |
| 11036140 | Substrate processing apparatus, substrate processing method and recording medium | Hiroshi Mizunoura, Yohei SANO, Takashi Yamauchi, Masashi Enomoto | 2021-06-15 |
| 10955743 | Substrate processing apparatus, substrate processing method and computer-readable recording medium | Hiroshi Mizunoura, Yohei SANO | 2021-03-23 |
| 10732508 | Coating and developing method and coating and developing apparatus | Hiroshi Mizunoura | 2020-08-04 |
| 10656526 | Substrate treatment method and thermal treatment apparatus | Yohei SANO, Masashi Enomoto, Takahiro Shiozawa, Keisuke Yoshida, Tomoya ONITSUKA | 2020-05-19 |
| 10603964 | Pneumatic tire | Hiroshi Kawabe | 2020-03-31 |
| 10394125 | Coating and developing method and coating and developing apparatus | Hiroshi Mizunoura | 2019-08-27 |
| 10139732 | Substrate processing apparatus, substrate processing method and recording medium | Hiroshi Mizunoura, Shinichi Hatakeyama | 2018-11-27 |
| 10101669 | Exposure apparatus, resist pattern forming method, and storage medium | Seiji Nagahara, Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Masaru Tomono +2 more | 2018-10-16 |
| 10025190 | Substrate treatment system | Seiji Nagahara, Gousuke Shiraishi, Satoru Shimura, Kousuke Yoshihara, Masaru Tomono +2 more | 2018-07-17 |
| 9810987 | Substrate treatment method, computer storage medium and substrate treatment system | Makoto Muramatsu, Takahiro Kitano, Tadatoshi Tomita, Takanori Nishi, Takashi Yamauchi | 2017-11-07 |
| 9748100 | Substrate processing method, storage medium and substrate processing system | Tomonori Esaki, Takashi Yamauchi | 2017-08-29 |
| 9097977 | Process sequence for reducing pattern roughness and deformity | — | 2015-08-04 |
| 8389206 | High normality solution for removing freeze material in lithographic applications | Shannon W. Dunn, Dave Hetzer | 2013-03-05 |