Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8940475 | Double patterning with inline critical dimension slimming | Dave Hetzer | 2015-01-27 |
| 8764999 | Sidewall image transfer pitch doubling and inline critical dimension slimming | Dave Hetzer | 2014-07-01 |
| 8647817 | Vapor treatment process for pattern smoothing and inline critical dimension slimming | Dave Hetzer | 2014-02-11 |
| 8507190 | Method for preparing alignment mark for multiple patterning | — | 2013-08-13 |
| 8389206 | High normality solution for removing freeze material in lithographic applications | Shinichiro KAWAKAMI, Dave Hetzer | 2013-03-05 |
| 7932017 | Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layer | — | 2011-04-26 |
| 7883835 | Method for double patterning a thin film | Sandra Hyland | 2011-02-08 |
| 7862985 | Method for double patterning a developable anti-reflective coating | — | 2011-01-04 |
| 7858293 | Method for double imaging a developable anti-reflective coating | — | 2010-12-28 |
| 7811747 | Method of patterning an anti-reflective coating by partial developing | Sandra Hyland | 2010-10-12 |
| 7767386 | Method of patterning an organic planarization layer | — | 2010-08-03 |
| 7432191 | Method of forming a dual damascene structure utilizing a developable anti-reflective coating | Harlan Stamper, Sandra Hyland | 2008-10-07 |