Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11574812 | Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers | Makoto Muramatsu, Hisashi Genjima, Gen You, Takahiro Kitano | 2023-02-07 |
| 10586711 | Substrate processing method and computer storage medium | Makoto Muramatsu, Hisashi Genjima, Takahiro Kitano | 2020-03-10 |
| 10418242 | Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers | Makoto Muramatsu, Hisashi Genjima, Gen You, Takahiro Kitano | 2019-09-17 |
| 10329144 | Substrate treatment method, computer storage medium and substrate treatment system | Makoto Muramatsu, Hisashi Genjima, Gen You, Takahiro Kitano, Takanori Nishi | 2019-06-25 |
| 10121659 | Pattern forming method and heating apparatus | Makoto Muramatsu, Takahiro Kitano, Keiji Tanouchi | 2018-11-06 |
| 9859118 | Pattern forming method and heating apparatus | Makoto Muramatsu, Takahiro Kitano, Keiji Tanouchi | 2018-01-02 |
| 9810987 | Substrate treatment method, computer storage medium and substrate treatment system | Makoto Muramatsu, Takahiro Kitano, Takanori Nishi, Shinichiro KAWAKAMI, Takashi Yamauchi | 2017-11-07 |
| 9748101 | Substrate treatment method, computer storage medium, and substrate treatment system | Makoto Muramatsu, Takahiro Kitano, Keiji Tanouchi, Soichiro Okada | 2017-08-29 |
| 9741583 | Substrate treatment method, computer readable storage medium and substrate treatment system | Makoto Muramatsu, Takahiro Kitano, Gen You, Takanori Nishi | 2017-08-22 |
| 9618849 | Pattern forming method, pattern forming apparatus, and computer readable storage medium | Makoto Muramatsu, Takahiro Kitano, Keiji Tanouchi | 2017-04-11 |
| 9530645 | Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium | Makoto Muramatsu, Takahiro Kitano, Keiji Tanouchi | 2016-12-27 |
| 9418860 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell, Makoto Muramatsu, Benjamen M. Rathsack, Hisashi Genjima, Hidetami Yaegashi +1 more | 2016-08-16 |
| 8367308 | Substrate processing method | Hiroshi Nakamura, Takafumi Niwa, Yuhei Kuwahara | 2013-02-05 |