Issued Patents All Time
Showing 1–25 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12165870 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Steven Scheer, Michael A. Carcasi, Benjamen M. Rathsack, Joshua Hooge | 2024-12-10 |
| 11998945 | Methods and systems to monitor, control, and synchronize dispense systems | Joshua Hooge, Michael A. Carcasi | 2024-06-04 |
| 11637031 | Systems and methods for spin process video analysis during substrate processing | Michael A. Carcasi, Joshua Hooge, Hiroyuki Iwaki, Masahide Tadokoro, Masashi Enomoto +2 more | 2023-04-25 |
| 11538684 | UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly | Ian J. Brown, Ihsan Simms, Ainhoa Romo Negreira, Kathleen Nafus | 2022-12-27 |
| 11474028 | Systems and methods for monitoring one or more characteristics of a substrate | Michael A. Carcasi, Joshua Hooge, Masahide Tadokoro | 2022-10-18 |
| 11456185 | Planarization of semiconductor devices | Ryan L. Burns, Corey Lemley | 2022-09-27 |
| 11455436 | Predicting across wafer spin-on planarization over a patterned topography | Ryan L. Burns | 2022-09-27 |
| 11339733 | Systems and methods to monitor particulate accumulation for bake chamber cleaning | Michael A. Carcasi | 2022-05-24 |
| 11262657 | System and method of planarization control using a cross-linkable material | Michael A. Carcasi, Ryan L. Burns | 2022-03-01 |
| 11163236 | Method and process for stochastic driven detectivity healing | Michael A. Carcasi, Seiji Nagahara, Congque DINH | 2021-11-02 |
| 11061332 | Methods for sensitizing photoresist using flood exposures | Michael A. Carcasi, Seiji Nagahara | 2021-07-13 |
| 10809620 | Systems and methods for developer drain line monitoring | Michael A. Carcasi, Joshua Hooge | 2020-10-20 |
| 10622267 | Facilitation of spin-coat planarization over feature topography during substrate fabrication | Ryan L. Burns, Benjamen M. Rathsack, Makoto Muramatsu | 2020-04-14 |
| 10490402 | UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly | Ian J. Brown, Ihsan Simms, Ainhoa Romo Negreira, Kathleen Nafus | 2019-11-26 |
| 10429745 | Photo-sensitized chemically amplified resist (PS-CAR) simulation | Michael A. Carcasi, Benjamen M. Rathsack, Wallace P. Printz, Seiji Nagahara, Seiichi Tagawa | 2019-10-01 |
| 10170354 | Subtractive methods for creating dielectric isolation structures within open features | Benjamen M. Rathsack | 2019-01-01 |
| 10048594 | Photo-sensitized chemically amplified resist (PS-CAR) model calibration | Michael A. Carcasi, Carlos A. Fonseca | 2018-08-14 |
| 10020195 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Steven Scheer, Michael A. Carcasi, Benjamen M. Rathsack, Joshua Hooge | 2018-07-10 |
| 9978618 | Hot plate with programmable array of lift devices for multi-bake process optimization | Josh Hooge, Michael A. Carcasi | 2018-05-22 |
| 9793137 | Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines | Benjamen M. Rathsack | 2017-10-17 |
| 9746774 | Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR) | Michael A. Carcasi | 2017-08-29 |
| 9715172 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Benjamen M. Rathsack | 2017-07-25 |
| 9633847 | Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition | Benjamen M. Rathsack | 2017-04-25 |
| 9613801 | Integration of absorption based heating bake methods into a photolithography track system | Michael A. Carcasi, Benjamen M. Rathsack | 2017-04-04 |
| 9519227 | Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) | Michael A. Carcasi, Joshua Hooge, Benjamen M. Rathsack, Seiji Nagahara | 2016-12-13 |