MT

Masahide Tadokoro

TL Tokyo Electron Limited: 25 patents #181 of 5,567Top 4%
Overall (All Time): #157,781 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
12228390 Information processing apparatus, information processing method and computer-readable recording medium Masashi Enomoto, Toyohisa Tsuruda, Hiroshi Nakamura, Kazuhiro Shiba 2025-02-18
12123778 Thermal imaging sensor for integration into track system Michael A. Carcasi, Kazuhiro Shiba, Masashi Enomoto, Toyohisa Tsuruda 2024-10-22
12051587 Substrate processing apparatus, estimation method of substrate processing and recording medium Hiroshi Nakamura, Masashi Enomoto 2024-07-30
11809091 Substrate processing apparatus and processing condition adjustment method Masashi Enomoto, Kentaro Yamamura 2023-11-07
11703459 System and method to calibrate a plurality of wafer inspection system (WIS) modules Michael A. Carcasi, Hiroyuki Iwaki, Toyohisa Tsuruda 2023-07-18
11637031 Systems and methods for spin process video analysis during substrate processing Michael A. Carcasi, Joshua Hooge, Mark H. Somervell, Hiroyuki Iwaki, Masashi Enomoto +2 more 2023-04-25
11474028 Systems and methods for monitoring one or more characteristics of a substrate Michael A. Carcasi, Mark H. Somervell, Joshua Hooge 2022-10-18
11062899 Coated film removing apparatus Takafumi Hasimoto, Taku Nagakane, Koji Takayanagi 2021-07-13
10649335 Substrate processing apparatus, substrate processing method and storage medium Teruhiko Kodama, Masashi Enomoto, Takafumi Hashimoto 2020-05-12
9899243 Light irradiation apparatus Yuichi Terashita, Gousuke Shiraishi, Tomohiro Iseki, Masaru Tomono, Hironori Mizoguchi 2018-02-20
8927906 Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method Yoshihiro Kondo, Takashi Saito 2015-01-06
8698052 Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plate Ryoichi Uemura, Mitsuteru Yano, Shinichi Shinozuka 2014-04-15
8308381 Substrate processing method, computer-readable storage medium, and substrate processing system Kunie Ogata 2012-11-13
8253077 Substrate processing method, computer-readable storage medium and substrate processing system Kunie Ogata, Tsuyoshi Shibata, Shinichi Shinozuka 2012-08-28
8242417 Temperature control method of heat processing plate, computer storage medium, and temperature control apparatus of heat processing plate Ryoichi Uemura, Mitsuteru Yano, Shinichi Shinozuka 2012-08-14
8135487 Temperature setting method and apparatus for a thermal processing plate Megumi Jyousaka, Yoshitaka Konishi, Shinichi Shinozuka, Kunie Ogata 2012-03-13
7985516 Substrate processing method, computer-readable storage medium and substrate processing system Kunie Ogata, Tsuyoshi Shibata, Shinichi Shinozuka 2011-07-26
7968260 Substrate processing method, computer-readable storage medium, and substrate processing system Kunie Ogata 2011-06-28
7957828 Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium Megumi Jyousaka, Yoshitaka Konishi, Shinichi Shinozuka, Kunie Ogata 2011-06-07
7910863 Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate Megumi Jyousaka, Hiroshi Tomita 2011-03-22
7902485 Temperature setting method of thermal processing plate, temperature setting apparatus of thermal processing plate, program, and computer-readable recording medium recording program thereon Megumi Jyousaka, Hiroshi Tomita 2011-03-08
7867674 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Michio Tanaka, Shinichi Shinozuka, Kunie Ogata, Hiroshi Tomita, Ryoichi Uemura 2011-01-11
7715952 Temperature setting of thermal processing plate using zernike coefficients Megumi Jyousaka, Hiroshi Tomita 2010-05-11
7643126 Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium Michio Tanaka 2010-01-05
7420650 Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium Michio Tanaka 2008-09-02