JH

Joshua Hooge

TL Tokyo Electron Limited: 22 patents #230 of 5,567Top 5%
🗺 Texas: #6,027 of 125,132 inventorsTop 5%
Overall (All Time): #188,268 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
12226796 Bath systems and methods thereof Michael A. Carcasi, Ihsan Simms, Joel Estrella, Antonio Luis Pacheco Rotondaro, Hiroshi Marumoto 2025-02-18
12165870 Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists Steven Scheer, Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell 2024-12-10
11998945 Methods and systems to monitor, control, and synchronize dispense systems Michael A. Carcasi, Mark H. Somervell 2024-06-04
11738363 Bath systems and methods thereof Michael A. Carcasi, Ihsan Simms, Joel Estrella, Antonio Luis Pacheco Rotondaro, Hiroshi Marumoto 2023-08-29
11637031 Systems and methods for spin process video analysis during substrate processing Michael A. Carcasi, Mark H. Somervell, Hiroyuki Iwaki, Masahide Tadokoro, Masashi Enomoto +2 more 2023-04-25
11624607 Hardware improvements and methods for the analysis of a spinning reflective substrates Michael A. Carcasi 2023-04-11
11474028 Systems and methods for monitoring one or more characteristics of a substrate Michael A. Carcasi, Mark H. Somervell, Masahide Tadokoro 2022-10-18
11276157 Systems and methods for automated video analysis detection techniques for substrate process Joel Estrella, Michael A. Carcasi 2022-03-15
11168978 Hardware improvements and methods for the analysis of a spinning reflective substrates Michael A. Carcasi 2021-11-09
10809620 Systems and methods for developer drain line monitoring Michael A. Carcasi, Mark H. Somervell 2020-10-20
10622233 Amelioration of global wafer distortion based on determination of localized distortions of a semiconductor wafer Nathan Ip, Joel Estrella, Anton J. deVilliers 2020-04-14
10534266 Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes Michael A. Carcasi, Benjamen M. Rathsack, Seiji Nagahara 2020-01-14
10403501 High-purity dispense system Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed +2 more 2019-09-03
10354872 High-precision dispense system with meniscus control Anton J. deVilliers, Rodney L. Robison, Ronald Nasman, David Travis, James Grootegoed +3 more 2019-07-16
10262880 Cover plate for wind mark control in spin coating process Derek Bassett, Wallace P. Printz, Katsunori Ichino, Yuichi Terashita, Kousuke Yoshihara 2019-04-16
10048587 Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoir Michael A. Carcasi, Wallace P. Printz 2018-08-14
10020195 Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists Steven Scheer, Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell 2018-07-10
9711419 Substrate backside texturing Carlos A. Fonseca, Benjamen M. Rathsack, Jeffrey Smith, Anton J. deVilliers, Lior Huli +1 more 2017-07-18
9618848 Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes Michael A. Carcasi, Benjamen M. Rathsack, Seiji Nagahara 2017-04-11
9519227 Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) Michael A. Carcasi, Mark H. Somervell, Benjamen M. Rathsack, Seiji Nagahara 2016-12-13
9454081 Line pattern collapse mitigation through gap-fill material application Mark H. Somervell, Benjamen M. Rathsack, Ian J. Brown, Steven Scheer 2016-09-27
8795952 Line pattern collapse mitigation through gap-fill material application Mark H. Somervell, Benjamen M. Rathsack, Ian J. Brown, Steven Scheer 2014-08-05