Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12165870 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell, Joshua Hooge | 2024-12-10 |
| 10020195 | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists | Michael A. Carcasi, Benjamen M. Rathsack, Mark H. Somervell, Joshua Hooge | 2018-07-10 |
| 9454081 | Line pattern collapse mitigation through gap-fill material application | Mark H. Somervell, Benjamen M. Rathsack, Ian J. Brown, Joshua Hooge | 2016-09-27 |
| 9383138 | Methods and heat treatment apparatus for uniformly heating a substrate during a bake process | Michael A. Carcasi | 2016-07-05 |
| 9085045 | Method and system for controlling a spike anneal process | Michael A. Carcasi | 2015-07-21 |
| 8795952 | Line pattern collapse mitigation through gap-fill material application | Mark H. Somervell, Benjamen M. Rathsack, Ian J. Brown, Joshua Hooge | 2014-08-05 |
| 8574810 | Dual tone development with a photo-activated acid enhancement component in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Wallace P. Printz | 2013-11-05 |
| 8568964 | Flood exposure process for dual tone development in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Wallace P. Printz | 2013-10-29 |
| 8449293 | Substrate treatment to reduce pattern roughness | Benjamin M. Rathsack, Mark H. Somervell | 2013-05-28 |
| 8288174 | Electrostatic post exposure bake apparatus and method | Benjamen M. Rathsack, Brian Head | 2012-10-16 |
| 8283111 | Method for creating gray-scale features for dual tone development processes | Carlos A. Fonseca, Mark H. Somervell | 2012-10-09 |
| 8257911 | Method of process optimization for dual tone development | Roel Gronheid, Sophie Bernard, Carlos A. Fonseca, Mark H. Somervell | 2012-09-04 |
| 8197996 | Dual tone development processes | Carlos A. Fonseca, Mark H. Somervell | 2012-06-12 |
| 8129080 | Variable resist protecting groups | Carlos A. Fonseca, Mark H. Somervell | 2012-03-06 |
| 8097402 | Using electric-field directed post-exposure bake for double-patterning (D-P) | Mark H. Somervell | 2012-01-17 |
| 7829269 | Dual tone development with plural photo-acid generators in lithographic applications | Carlos A. Fonseca, Mark H. Somervell, Wallace P. Printz | 2010-11-09 |
| 7816069 | Graded spin-on organic antireflective coating for photolithography | Colin J. Brodsky, Sean D. Burns, Dario L. Goldfarb, Michael Lercel, David R. Medeiros +3 more | 2010-10-19 |
| 7673278 | Enhanced process yield using a hot-spot library | Benjamen M. Rathsack, Kathleen Nafus | 2010-03-02 |
| 7632631 | Method of preventing pinhole defects through co-polymerization | Colin J. Brodsky | 2009-12-15 |
| 7588879 | Graded spin-on organic antireflective coating for photolithography | Colin J. Brodsky, Sean D. Burns, Dario L. Goldfarb, Michael Lercel, David R. Medeiros +3 more | 2009-09-15 |
| 7541065 | Method of forming film stack having under layer for preventing pinhole defects | Colin J. Brodsky, Wai-Kin Li | 2009-06-02 |
| 7483804 | Method of real time dynamic CD control | — | 2009-01-27 |
| 7473461 | Film stack having under layer for preventing pinhole defects | Colin J. Brodsky, Wai-Kin Li | 2009-01-06 |
| 7267863 | Film stack having under layer for preventing pinhole defects | Colin J. Brodsky, Wai-Kin Li | 2007-09-11 |
| 7132316 | After deposition method of thinning film to reduce pinhole defects | Wai-Kin Li, Colin J. Brodsky | 2006-11-07 |