Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372345 | 3D profilometry with a Linnik interferometer | Amnon Manassen, Yoav Grauer, Shlomo Eisenbach, Stephen Hiebert, Avner Safrani | 2025-07-29 |
| 12164277 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Franz Zach, Mark D. Smith | 2024-12-10 |
| 12153352 | System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target | Xuemei Chen | 2024-11-26 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2024-06-18 |
| 11782411 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Franz Zach, Mark D. Smith | 2023-10-10 |
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Sharon Aharon, Evgeni Gurevich, Anna Golotsvan +1 more | 2022-12-27 |
| 11460783 | System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target | Xuemei Chen | 2022-10-04 |
| 11092893 | Inspection sensitivity improvements for optical and electron beam inspection | Andrew Cross | 2021-08-17 |
| 10901325 | Determining the impacts of stochastic behavior on overlay metrology data | Evgeni Gurevich, Michael Adel, Yoel Feler, Vladimir Levinski, Dana Klein +1 more | 2021-01-26 |
| 10824078 | Lithographic mask layer | Arjun Singh, Werner Knaepen | 2020-11-03 |
| 10741394 | Combined anneal and selective deposition process | Jan Willem Maes, Werner Knaepen, Arjun Singh | 2020-08-11 |
| 10720336 | Method for manufacturing a mask | Emily Gallagher, Jan Doise, Iacopo Mochi | 2020-07-21 |
| 10551741 | Method of forming a directed self-assembled layer on a substrate | Werner Knaepen, Jan Willem Maes, Maarten Stokhof, Hari Pathangi Sriraman | 2020-02-04 |
| 10204782 | Combined anneal and selective deposition process | Jan Willem Maes, Werner Knaepen, Arjun Singh | 2019-02-12 |
| 10192956 | Method for producing fin structures of a semiconductor device in a substrate | Boon Teik Chan, Safak Sayan, Min Soo Kim, Doni Parnell | 2019-01-29 |
| 10186459 | Selective fin cut | Vladimir Machkaoutsan | 2019-01-22 |
| 10048212 | Quality assessment of directed self-assembling method | Lieve Van Look, Paulina Alejandra Rincon Delgadillo | 2018-08-14 |
| 9391141 | Method for producing fin structures of a semiconductor device in a substrate | Boon Teik Chan, Safak Sayan, Min Soo Kim, Doni Parnell | 2016-07-12 |
| 9041164 | Conformal anti-reflective coating | Christoph Adelmann, Annelies Delabie, Gustaf Winroth | 2015-05-26 |
| 8257911 | Method of process optimization for dual tone development | Sophie Bernard, Carlos A. Fonseca, Mark H. Somervell, Steven Scheer | 2012-09-04 |
| 7695877 | Methods and devices for lithography using electromagnetic radiation with short wavelengths | Leonardus Leunissen | 2010-04-13 |