Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12197137 | System and method for determining post bonding overlay | Mark D. Smith, Xiaomeng Shen, Jason Saito, David Owen | 2025-01-14 |
| 12164277 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Mark D. Smith, Roel Gronheid | 2024-12-10 |
| 11829077 | System and method for determining post bonding overlay | Mark D. Smith, Xiaomeng Shen, Jason Saito, David Owen | 2023-11-28 |
| 11782411 | System and method for mitigating overlay distortion patterns caused by a wafer bonding tool | Mark D. Smith, Roel Gronheid | 2023-10-10 |
| 10386829 | Systems and methods for controlling an etch process | — | 2019-08-20 |
| 8141008 | Optical lithography correction process | — | 2012-03-20 |
| 7923786 | Selective silicon-on-insulator isolation structure and method | An Steegen, Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Robert C. Wong | 2011-04-12 |
| 7882456 | Optical lithography correction process | — | 2011-02-01 |
| 7861209 | Method for interlayer and yield based optical proximity correction | — | 2010-12-28 |
| 7784019 | Yield based retargeting for semiconductor design flow | — | 2010-08-24 |
| 7712069 | Method for interlayer and yield based optical proximity correction | — | 2010-05-04 |
| 7600212 | Method of compensating photomask data for the effects of etch and lithography processes | Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Xuelong Cao, Abdurrahman Sezginer | 2009-10-06 |
| 7588868 | Method and system for reducing the impact of across-wafer variations on critical dimension measurements | Abdurrahman Sezginer, Gokhan Percin | 2009-09-15 |
| 7536670 | Method for verifying and choosing lithography model | Gokhan Percin, Ram Ramanujam | 2009-05-19 |
| 7444615 | Calibration on wafer sweet spots | Gokhan Percin, Ram Ramanujam, Abdurrahman Sezginer, Chi-Song Horng, Roy Prasad | 2008-10-28 |
| 7392502 | Method for real time monitoring and verifying optical proximity correction model and method | Gokhan Percin, Ram Ramanujam, Koichi Suzuki | 2008-06-24 |
| 7334212 | Method for interlayer and yield based optical proximity correction | — | 2008-02-19 |
| 7326983 | Selective silicon-on-insulator isolation structure and method | An Steegen, Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Robert C. Wong | 2008-02-05 |
| 7246343 | Method for correcting position-dependent distortions in patterning of integrated circuits | Devendra Joshi, Abdurrahman Sezginer | 2007-07-17 |
| 7224437 | Method for measuring and verifying stepper illumination | Gokhan Percin, Abdurrahman Sezginer | 2007-05-29 |
| 7189481 | Characterizing flare of a projection lens | Bo Wu, Abdurrahman Sezginer | 2007-03-13 |
| 7124396 | Alternating phase-shift mask rule compliant IC design | — | 2006-10-17 |
| 6961920 | Method for interlayer and yield based optical proximity correction | — | 2005-11-01 |
| 6936522 | Selective silicon-on-insulator isolation structure and method | An Steegen, Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Robert C. Wong | 2005-08-30 |
| 6927172 | Process to suppress lithography at a wafer edge | Wolfgang Bergner, Linda A. Chen, Stephan Kudelka | 2005-08-09 |