Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7928443 | Method and structure for forming strained SI for CMOS devices | Haining Yang, Ying Zhang | 2011-04-19 |
| 7923786 | Selective silicon-on-insulator isolation structure and method | Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Franz Zach, Robert C. Wong | 2011-04-12 |
| 7700951 | Method and structure for forming strained Si for CMOS devices | Haining Yang, Ying Zhang | 2010-04-20 |
| 7655557 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2010-02-02 |
| 7550338 | Method and structure for forming strained SI for CMOS devices | Haining Yang, Ying Zhang | 2009-06-23 |
| 7429752 | Method and structure for forming strained SI for CMOS devices | Haining Yang, Ying Zhang | 2008-09-30 |
| 7411227 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2008-08-12 |
| 7396714 | Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions | Huajie Chen, Dureseti Chidambarrao, Oleg Gluschenkov, Haining Yang | 2008-07-08 |
| 7326983 | Selective silicon-on-insulator isolation structure and method | Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Franz Zach, Robert C. Wong | 2008-02-05 |
| 7326610 | Process options of forming silicided metal gates for advanced CMOS devices | Ricky S. Amos, Douglas A. Buchanan, Cyril Cabral, Jr., Evgeni Gousev, Victor Ku | 2008-02-05 |
| 7291528 | Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions | Huajie Chen, Dureseti Chidambarrao, Oleg Gluschenkov, Haining Yang | 2007-11-06 |
| 7129126 | Method and structure for forming strained Si for CMOS devices | Haining Yang, Ying Zhang | 2006-10-31 |
| 7112481 | Method for forming self-aligned dual salicide in CMOS technologies | Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more | 2006-09-26 |
| 7081397 | Trench sidewall passivation for lateral RIE in a selective silicon-on-insulator process flow | Christopher V. Baiocco, Ying Zhang | 2006-07-25 |
| 7067368 | Method for forming self-aligned dual salicide in CMOS technologies | Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more | 2006-06-27 |
| 7064025 | Method for forming self-aligned dual salicide in CMOS technologies | Sunfei Fang, Cyril Cabral, Jr., Chester T. Dziobkowski, John J. Ellis-Monaghan, Christian Lavoie +3 more | 2006-06-20 |
| 7056794 | FET gate structure with metal gate electrode and silicide contact | Victor Ku, Hsing-Jen Wann | 2006-06-06 |
| 7056782 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more | 2006-06-06 |
| 7029966 | Process options of forming silicided metal gates for advanced CMOS devices | Ricky S. Amos, Douglas A. Buchanan, Cyril Cabral, Jr., Evgeni Gousev, Victor Ku | 2006-04-18 |
| 6974736 | Method of forming FET silicide gate structures incorporating inner spacers | Victor Ku, Hsing-Jen Wann, Keith Kwong Hon Wong | 2005-12-13 |
| 6936522 | Selective silicon-on-insulator isolation structure and method | Maheswaran Surendra, Hsing-Jen Wann, Ying Zhang, Franz Zach, Robert C. Wong | 2005-08-30 |
| 6927117 | Method for integration of silicide contacts and silicide gate metals | Cyril Cabral, Jr., Jakub Kedzierski, Victor Ku, Christian Lavoie, Vijay Narayanan | 2005-08-09 |
| 6921711 | Method for forming metal replacement gate of high performance | Cyril Cabral, Jr., Paul C. Jamison, Victor Ku, Ying Li, Vijay Narayanan +2 more | 2005-07-26 |
| 6891192 | Structure and method of making strained semiconductor CMOS transistors having lattice-mismatched semiconductor regions underlying source and drain regions | Huajie Chen, Dureseti Chidambarrao, Oleg Gluschenkov, Haining Yang | 2005-05-10 |
| 6876040 | Dense SRAM cells with selective SOI | Hsingjen Wann, Ying Zhang, Robert C. Wong | 2005-04-05 |