| 7655557 |
CMOS silicide metal gate integration |
Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more |
2010-02-02 |
| 7635648 |
Methods for fabricating dual material gate in a semiconductor device |
Igor Peidous, Joe Piccirillo |
2009-12-22 |
| 7411227 |
CMOS silicide metal gate integration |
Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more |
2008-08-12 |
| 7326610 |
Process options of forming silicided metal gates for advanced CMOS devices |
Ricky S. Amos, Douglas A. Buchanan, Cyril Cabral, Jr., Evgeni Gousev, An Steegen |
2008-02-05 |
| 7056794 |
FET gate structure with metal gate electrode and silicide contact |
An Steegen, Hsing-Jen Wann |
2006-06-06 |
| 7056782 |
CMOS silicide metal gate integration |
Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Jakub Kedzierski +6 more |
2006-06-06 |
| 7041538 |
Method of manufacturing a disposable reversed spacer process for high performance recessed channel CMOS |
Meikei Ieong, Omer H. Dokumaci, Thomas S. Kanarsky |
2006-05-09 |
| 7029966 |
Process options of forming silicided metal gates for advanced CMOS devices |
Ricky S. Amos, Douglas A. Buchanan, Cyril Cabral, Jr., Evgeni Gousev, An Steegen |
2006-04-18 |
| 6974736 |
Method of forming FET silicide gate structures incorporating inner spacers |
An Steegen, Hsing-Jen Wann, Keith Kwong Hon Wong |
2005-12-13 |
| 6927117 |
Method for integration of silicide contacts and silicide gate metals |
Cyril Cabral, Jr., Jakub Kedzierski, Christian Lavoie, Vijay Narayanan, An Steegen |
2005-08-09 |
| 6921711 |
Method for forming metal replacement gate of high performance |
Cyril Cabral, Jr., Paul C. Jamison, Ying Li, Vijay Narayanan, An Steegen +2 more |
2005-07-26 |
| 6677646 |
Method and structure of a disposable reversed spacer process for high performance recessed channel CMOS |
Meikei Ieong, Omer H. Dokumaci, Thomas S. Kanarsky |
2004-01-13 |
| 6544874 |
Method for forming junction on insulator (JOI) structure |
Jack A. Mandelman, Kevin K. Chan, Bomy Chen, Oleg Gluschenkov, Rajarao Jammy +2 more |
2003-04-08 |
| 6528363 |
Fabrication of notched gates by passivating partially etched gate sidewalls and then using an isotropic etch |
Maheswaran Surendra, Len Yuan Tsou, Ying Zhang |
2003-03-04 |
| 6506649 |
Method for forming notch gate having self-aligned raised source/drain structure |
Ka-Hing Fung, Atul Ajmera, Dominic J. Schepis |
2003-01-14 |
| 6437377 |
Low dielectric constant sidewall spacer using notch gate process |
Atul Ajmera, Ka-Hing Fung, Dominic J. Schepis |
2002-08-20 |
| 6383918 |
Method for reducing semiconductor contact resistance |
Delbert Parks |
2002-05-07 |
| 6184119 |
Methods for reducing semiconductor contact resistance |
Delbert Parks |
2001-02-06 |
