Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11777422 | Multilayered microhydraulic actuators | — | 2023-10-03 |
| 10297835 | Flexible and implantable glucose fuel cell | Rahul Sarpeshkar, Jeremy Muldavin, Todd A. Thorsen, Benjamin I. Rapoport, Michale Sean Fee | 2019-05-21 |
| 7859060 | Ultra thin silicon on insulator | Kevin K. Chan, Raymond M. Sicina | 2010-12-28 |
| 7816224 | Method for fabricating an ultra thin silicon on insulator | Kevin K. Chan, Raymond M. Sicina | 2010-10-19 |
| 7659153 | Sectional field effect devices and method of fabrication | Ying Zhang, Bruce B. Doris, Thomas S. Kanarsky, Meikei Ieong | 2010-02-09 |
| 7655557 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Victor Ku +6 more | 2010-02-02 |
| 7413941 | Method of fabricating sectional field effect devices | Ying Zhang, Bruce B. Doris, Thomas S. Kanarsky, Meikei Ieong | 2008-08-19 |
| 7411227 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Victor Ku +6 more | 2008-08-12 |
| 7388258 | Sectional field effect devices | Ying Zhang, Bruce B. Doris, Thomas S. Kanarsky, Meikei Ieong | 2008-06-17 |
| 7250658 | Hybrid planar and FinFET CMOS devices | Bruce B. Doris, Diane C. Boyd, Meikei Leong, Thomas S. Kanarsky, Min Yang | 2007-07-31 |
| 7183182 | Method and apparatus for fabricating CMOS field effect transistors | Cyril Cabral, Jr., Meikei Ieong | 2007-02-27 |
| 7151023 | Metal gate MOSFET by full semiconductor metal alloy conversion | Hasan M. Nayfeh, Mahender Kumar, Sunfei Fang, Cyril Cabral, Jr. | 2006-12-19 |
| 7056782 | CMOS silicide metal gate integration | Ricky S. Amos, Diane C. Boyd, Cyril Cabral, Jr., Richard D. Kaplan, Victor Ku +6 more | 2006-06-06 |
| 6927117 | Method for integration of silicide contacts and silicide gate metals | Cyril Cabral, Jr., Victor Ku, Christian Lavoie, Vijay Narayanan, An Steegen | 2005-08-09 |
| 6911383 | Hybrid planar and finFET CMOS devices | Bruce B. Doris, Diane C. Boyd, Meikei Ieong, Thomas S. Kanarsky, Min Yang | 2005-06-28 |
| 6846734 | Method and process to make multiple-threshold metal gates CMOS technology | Ricky S. Amos, Katayun Barmak, Diane C. Boyd, Cyril Cabral, Jr., Meikei Leong +1 more | 2005-01-25 |
| 6413802 | Finfet transistor structures having a double gate channel extending vertically from a substrate and methods of manufacture | Chenming Hu, Tsu-Jae King, Vivek Subramanian, Leland Chang, Xuejue Huang +4 more | 2002-07-02 |