Issued Patents All Time
Showing 1–25 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9401424 | High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture | Huajie Chen, Dureseti Chidambarrao | 2016-07-26 |
| 9040373 | Silicon device on SI:C-OI and SGOI and method of manufacture | Dureseti Chidambarrao, Oleg Gluschenkov | 2015-05-26 |
| 9023698 | High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture | Huajie Chen, Dureseti Chidambarrao | 2015-05-05 |
| 8901566 | High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture | Huajie Chen, Dureseti Chidambarrao | 2014-12-02 |
| 8633071 | Silicon device on Si: C-oi and Sgoi and method of manufacture | Duresti Chidambarrao, Oleg Gluschenkov | 2014-01-21 |
| 8232153 | Silicon device on Si:C-OI and SGOI and method of manufacture | Dureseti Chidambarrao, Oleg Gluschenkov | 2012-07-31 |
| 8168489 | High performance stress-enhanced MOSFETS using Si:C and SiGe epitaxial source/drain and method of manufacture | Huajie Chen, Dureseti Chidambarrao | 2012-05-01 |
| 8119472 | Silicon device on Si:C SOI and SiGe and method of manufacture | Dureseti Chidambarrao, Oleg Gluschenkov | 2012-02-21 |
| 8067805 | Ultra shallow junction formation by epitaxial interface limited diffusion | Huajie Chen, Oleg Gluschenkov, Werner Rausch | 2011-11-29 |
| 8013397 | Embedded stressed nitride liners for CMOS performance improvement | Dureseti Chidambarrao | 2011-09-06 |
| 7994612 | FinFETs single-sided implant formation | Brent A. Anderson, Andres Bryant, Josephine B. Chang, Edward J. Nowak | 2011-08-09 |
| 7964865 | Strained silicon on relaxed sige film with uniform misfit dislocation density | Dureseti Chidambarrao | 2011-06-21 |
| 7960790 | Self-aligned planar double-gate transistor structure | Bruce B. Doris, Kathryn Guarini, Suryanararyan G. Hegde, Meikei Ieong, Erin C. Jones | 2011-06-14 |
| 7952149 | Anti-halo compensation | Oleg Gluschenkov | 2011-05-31 |
| 7859061 | Halo-first ultra-thin SOI FET for superior short channel control | John Michael Hergenrother, Shreesh Narasimha, Jeffrey W. Sleight | 2010-12-28 |
| 7816237 | Ultra shallow junction formation by epitaxial interface limited diffusion | Huajie Chen, Oleg Gluschenkov, Werner Rausch | 2010-10-19 |
| 7754569 | Anti-halo compensation | Oleg Gluschenkev | 2010-07-13 |
| 7750410 | Structure and method to improve channel mobility by gate electrode stress modification | Michael P. Belyansky, Dureseti Chidambarrao, Bruce B. Doris, Oleg Gluschenkov | 2010-07-06 |
| 7745277 | MOSFET performance improvement using deformation in SOI structure | Dureseti Chidambarrao | 2010-06-29 |
| 7732288 | Method for fabricating a semiconductor structure | Huilong Zhu, Lawrence A. Clevenger, Oleg Gluschenkov, Kaushik A. Kumar, Carl Radens +1 more | 2010-06-08 |
| 7696025 | Sidewall semiconductor transistors | Huilong Zhu, Lawrence A. Clevenger, Kaushik A. Kumar, Carl Radens, Dureseti Chidambarrao | 2010-04-13 |
| 7682887 | Transistor having high mobility channel and methods | Woo-Hyeong Lee | 2010-03-23 |
| 7615454 | Embedded stressed nitride liners for CMOS performance improvement | Dureseti Chidambarrao | 2009-11-10 |
| 7595247 | Halo-first ultra-thin SOI FET for superior short channel control | John Michael Hergenrother, Shreesh Narasimha, Jeffrey W. Sleight | 2009-09-29 |
| 7560328 | Strained Si on multiple materials for bulk or SOI substrates | Dureseti Chidambarrao, Oleg Gluschenkov, Huilong Zhu | 2009-07-14 |