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2011-05-17 |
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Omer H. Dokumaci, Shreesh Narasimha, Jeffrey W. Sleight |
2010-12-28 |
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Method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
David M. Fried, Sharee McNab, Michael J. Rooks, Anna W. Topol |
2010-04-13 |
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Selective incorporation of charge for transistor channels |
Zhibin Ren, Dinkar Singh, Jeffrey W. Sleight |
2010-03-30 |
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2009-06-23 |
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Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain |
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2008-12-09 |
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Selective incorporation of charge for transistor channels |
Zhibin Ren, Dinkar Singh, Jeffrey W. Sleight |
2008-05-20 |
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Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain |
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Yih-Feng Chyan, Donald Monroe |
2005-06-07 |
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2003-02-11 |
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2001-03-06 |
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Process for fabricating vertical transistors |
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2000-02-22 |
