Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8754530 | Self-aligned borderless contacts for high density electronic and memory device integration | Katherina Babich, Josephine B. Chang, Nicholas C. M. Fuller, Michael A. Guillorn, Isaac Lauer | 2014-06-17 |
| 8445892 | p-FET with a strained nanowire channel and embedded SiGe source and drain stressors | Guy M. Cohen, Conal E. Murray | 2013-05-21 |
| 8399314 | p-FET with a strained nanowire channel and embedded SiGe source and drain stressors | Guy M. Cohen, Conal E. Murray | 2013-03-19 |
| 8241957 | Negative thermal expansion system (NTES) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging | Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more | 2012-08-14 |
| 8153494 | Nanowire MOSFET with doped epitaxial contacts for source and drain | Jack O. Chu, Guy M. Cohen, John A. Ott, Paul M. Solomon | 2012-04-10 |
| 8120138 | High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels | David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol | 2012-02-21 |
| 8119206 | Negative coefficient of thermal expansion particles | Gareth G. Hougham, Xiao Hu Liu, S. Jay Chey, Joseph Zinter, Brian Richard Sundolf +1 more | 2012-02-21 |
| 8008095 | Methods for fabricating contacts to pillar structures in integrated circuits | Solomon Assefa, Gregory Costrini, Christopher V. Jahnes, Jonathan Zanhong Sun | 2011-08-30 |
| 7999251 | Nanowire MOSFET with doped epitaxial contacts for source and drain | Jack O. Chu, Guy M. Cohen, John A. Ott, Paul M. Solomon | 2011-08-16 |
| 7883919 | Negative thermal expansion system (NTEs) device for TCE compensation in elastomer compsites and conductive elastomer interconnects in microelectronic packaging | Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more | 2011-02-08 |
| 7696057 | Method for co-alignment of mixed optical and electron beam lithographic fabrication levels | David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol | 2010-04-13 |
| 7579069 | Negative coefficient of thermal expansion particles and method of forming the same | Gareth G. Hougham, Xiao Hu Liu, S. Jay Chey, James P. Doyle, Joseph Zinter +2 more | 2009-08-25 |
| 7572499 | Contact magnetic transfer template | Zvonimir Z. Bandic, A. David Erpelding, Jordan Asher Katine, Quang Le, Kim Y. Lee +1 more | 2009-08-11 |
| 7556979 | Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging | Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more | 2009-07-07 |
| 7550361 | Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels | David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol | 2009-06-23 |
| 7525109 | Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system | Thomas R. Albrecht, Zvonimir Z. Bandic | 2009-04-28 |
| 7417315 | Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging | Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more | 2008-08-26 |
| 7160477 | Method for making a contact magnetic transfer template | Zvonimir Z. Bandic, A. David Erpelding, Jordan Asher Katine, Quang Le, Kim Y. Lee +1 more | 2007-01-09 |
| 7037638 | High sensitivity crosslinkable photoresist composition, based on soluble, film forming dendrimeric calix[4] arene compositions method and for use thereof | Ali Afzali-Ardakani, Tricia Breen, Jeffrey D. Gelorme, David B. Mitzi | 2006-05-02 |
| 6821715 | Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensors | Robert E. Fontana, Jr., Jordan Asher Katine, Jennifer Liu, Scott A. MacDonald, Hugo Alberto Emilio Santini | 2004-11-23 |
| 6440639 | High-aspect ratio resist development using safe-solvent mixtures of alcohol and water | Robert E. Fontana, Jr., Jordan Asher Katine, Ernst Kratschmer, Ching Hwa Tsang, Raman Viswanathan | 2002-08-27 |
| 6280908 | Post-development resist hardening by vapor silylation | Ari Aviram | 2001-08-28 |