| 8754530 |
Self-aligned borderless contacts for high density electronic and memory device integration |
Katherina Babich, Josephine B. Chang, Nicholas C. M. Fuller, Michael A. Guillorn, Isaac Lauer |
2014-06-17 |
| 8445892 |
p-FET with a strained nanowire channel and embedded SiGe source and drain stressors |
Guy M. Cohen, Conal E. Murray |
2013-05-21 |
| 8399314 |
p-FET with a strained nanowire channel and embedded SiGe source and drain stressors |
Guy M. Cohen, Conal E. Murray |
2013-03-19 |
| 8241957 |
Negative thermal expansion system (NTES) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging |
Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more |
2012-08-14 |
| 8153494 |
Nanowire MOSFET with doped epitaxial contacts for source and drain |
Jack O. Chu, Guy M. Cohen, John A. Ott, Paul M. Solomon |
2012-04-10 |
| 8120138 |
High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol |
2012-02-21 |
| 8119206 |
Negative coefficient of thermal expansion particles |
Gareth G. Hougham, Xiao Hu Liu, S. Jay Chey, Joseph Zinter, Brian Richard Sundolf +1 more |
2012-02-21 |
| 8008095 |
Methods for fabricating contacts to pillar structures in integrated circuits |
Solomon Assefa, Gregory Costrini, Christopher V. Jahnes, Jonathan Zanhong Sun |
2011-08-30 |
| 7999251 |
Nanowire MOSFET with doped epitaxial contacts for source and drain |
Jack O. Chu, Guy M. Cohen, John A. Ott, Paul M. Solomon |
2011-08-16 |
| 7883919 |
Negative thermal expansion system (NTEs) device for TCE compensation in elastomer compsites and conductive elastomer interconnects in microelectronic packaging |
Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more |
2011-02-08 |
| 7696057 |
Method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol |
2010-04-13 |
| 7579069 |
Negative coefficient of thermal expansion particles and method of forming the same |
Gareth G. Hougham, Xiao Hu Liu, S. Jay Chey, James P. Doyle, Joseph Zinter +2 more |
2009-08-25 |
| 7572499 |
Contact magnetic transfer template |
Zvonimir Z. Bandic, A. David Erpelding, Jordan Asher Katine, Quang Le, Kim Y. Lee +1 more |
2009-08-11 |
| 7556979 |
Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging |
Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more |
2009-07-07 |
| 7550361 |
Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
David M. Fried, John Michael Hergenrother, Sharee McNab, Anna W. Topol |
2009-06-23 |
| 7525109 |
Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system |
Thomas R. Albrecht, Zvonimir Z. Bandic |
2009-04-28 |
| 7417315 |
Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging |
Gareth G. Hougham, S. Jay Chey, James P. Doyle, Xiao Hu Liu, Christopher V. Jahnes +2 more |
2008-08-26 |
| 7160477 |
Method for making a contact magnetic transfer template |
Zvonimir Z. Bandic, A. David Erpelding, Jordan Asher Katine, Quang Le, Kim Y. Lee +1 more |
2007-01-09 |
| 7037638 |
High sensitivity crosslinkable photoresist composition, based on soluble, film forming dendrimeric calix[4] arene compositions method and for use thereof |
Ali Afzali-Ardakani, Tricia Breen, Jeffrey D. Gelorme, David B. Mitzi |
2006-05-02 |
| 6821715 |
Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensors |
Robert E. Fontana, Jr., Jordan Asher Katine, Jennifer Liu, Scott A. MacDonald, Hugo Alberto Emilio Santini |
2004-11-23 |
| 6440639 |
High-aspect ratio resist development using safe-solvent mixtures of alcohol and water |
Robert E. Fontana, Jr., Jordan Asher Katine, Ernst Kratschmer, Ching Hwa Tsang, Raman Viswanathan |
2002-08-27 |
| 6280908 |
Post-development resist hardening by vapor silylation |
Ari Aviram |
2001-08-28 |
