Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12099304 | Electron beam lithography with dynamic fin overlay correction | Simon Dawes | 2024-09-24 |
| 11852975 | Electron beam lithography with dynamic fin overlay correction | Simon Dawes | 2023-12-26 |
| 6440639 | High-aspect ratio resist development using safe-solvent mixtures of alcohol and water | Robert E. Fontana, Jr., Jordan Asher Katine, Michael J. Rooks, Ching Hwa Tsang, Raman Viswanathan | 2002-08-27 |