RV

Raman Viswanathan

IBM: 11 patents #9,995 of 70,183Top 15%
BH Baker Hughes Holdings: 3 patents #995 of 3,522Top 30%
DI Dresser Industries: 2 patents #157 of 787Top 20%
BC Baker Hughes, A Ge Company: 1 patents #709 of 1,459Top 50%
Overall (All Time): #275,889 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10365402 Telemetry method and system for subsurface well and reservoir logging data Otto N. Fanini, Jorge O. Maxit, Harold Andrade 2019-07-30
9664815 Telemetry method and system for subsurface well and reservoir and logging data Otto N. Fanini, Jorge O. Maxit, Harold Andrade 2017-05-30
8581742 Bandwidth wireline data transmission system and method Randy Gold 2013-11-12
8023690 Apparatus and method for imaging fluids downhole Rocco DiFoggio, Jeffery W. Fontenot 2011-09-20
7767385 Method for lithography for optimizing process conditions Carl E. Larson, Sharee McNab, Steven E. Steen, Gregory Michael Wallraff 2010-08-03
7659050 High resolution silicon-containing resist James J. Bucchignano, Wu-Song Huang, David P. Klaus, Lidija Sekaric 2010-02-09
7399573 Method for using negative tone silicon-containing resist for e-beam lithography Wu-Song Huang, Lidija Sekaric, James J. Bucchignano, David P. Klaus 2008-07-15
6440639 High-aspect ratio resist development using safe-solvent mixtures of alcohol and water Robert E. Fontana, Jr., Jordan Asher Katine, Ernst Kratschmer, Michael J. Rooks, Ching Hwa Tsang 2002-08-27
6316123 Microwave annealing Kam-Leung Lee, David Lewis, Ronnen Andrew Roy 2001-11-13
6172399 Formation of ultra-shallow semiconductor junction using microwave annealing Kam-Leung Lee, David Lewis 2001-01-09
6051283 Microwave annealing Kam-Leung Lee, David Lewis, Ronnen Andrew Roy 2000-04-18
6051483 Formation of ultra-shallow semiconductor junction using microwave annealing Kam-Leung Lee, David Lewis 2000-04-18
6009143 Mirror for providing selective exposure in X-ray lithography Raul E. Acosta, Jerome Paul Silverman 1999-12-28
5781607 Membrane mask structure, fabrication and use Raul E. Acosta 1998-07-14
5051598 Method for correcting proximity effects in electron beam lithography Christopher J. Ashton, Porter Dean Gerber, Dieter Kern, Walter W. Molzen, Jr., Stephen A. Rishton +1 more 1991-09-24
4556884 Depth dependent multiple logging system Anthony P. S. Howells, Anthony M. Dienglewicz, Jorg A. Angehrn 1985-12-03
4346593 Well logging correction method and apparatus Anthony P. S. Howells, Jorg A. Angehrn 1982-08-31