Issued Patents All Time
Showing 1–25 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12062614 | Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements | John Bruley, Jack O. Chu, Ahmet S. Ozcan, Paul M. Solomon, Jeng-Bang Yau | 2024-08-13 |
| 11862567 | Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements | John Bruley, Jack O. Chu, Ahmet S. Ozcan, Paul M. Solomon, Jeng-Bang Yau | 2024-01-02 |
| 11101219 | Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements | John Bruley, Jack O. Chu, Ahmet S. Ozcan, Paul M. Solomon, Jeng-Bang Yau | 2021-08-24 |
| 10985105 | Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements | John Bruley, Jack O. Chu, Ahmet S. Ozcan, Paul M. Solomon, Jeng-Bang Yau | 2021-04-20 |
| 10833150 | Fast recrystallization of hafnium or zirconium based oxides in insulator-metal structures | Martin M. Frank, Eduard A. Cartier, Vijay Narayanan, Jean Fompeyrine, Stefan Abel +2 more | 2020-11-10 |
| 10541151 | Disposable laser/flash anneal absorber for embedded neuromorphic memory device fabrication | Deborah A. Neumayer, Son V. Nguyen, Martin M. Frank, Vijay Narayanan | 2020-01-21 |
| 10529832 | Shallow, abrupt and highly activated tin extension implant junction | John Bruley, Marinus Hopstaken | 2020-01-07 |
| 10269714 | Low resistance contacts including intermetallic alloy of nickel, platinum, titanium, aluminum and type IV semiconductor elements | John Bruley, Jack O. Chu, Ahmet S. Ozcan, Paul M. Solomon, Jeng-Bang Yau | 2019-04-23 |
| 10134882 | Method of junction control for lateral bipolar junction transistor | Pouya Hashemi, Tak H. Ning, Jeng-Bang Yau | 2018-11-20 |
| 9929258 | Method of junction control for lateral bipolar junction transistor | Pouya Hashemi, Tak H. Ning, Jeng-Bang Yau | 2018-03-27 |
| 9922886 | Silicon-germanium FinFET device with controlled junction | Kangguo Cheng, Pouya Hashemi, Alexander Reznicek | 2018-03-20 |
| 9514997 | Silicon-germanium FinFET device with controlled junction | Kangguo Cheng, Pouya Hashemi, Alexander Reznicek | 2016-12-06 |
| 9406569 | Semiconductor device having diffusion barrier to reduce back channel leakage | Gregory G. Freeman, Chengwen Pei, Geng Wang, Yanli Zhang | 2016-08-02 |
| 9240354 | Semiconductor device having diffusion barrier to reduce back channel leakage | Gregory G. Freeman, Chengwen Pei, Geng Wang, Yanli Zhang | 2016-01-19 |
| 9196712 | FinFET extension regions | Mohammad Hasanuzzaman, Jeffrey B. Johnson | 2015-11-24 |
| 9105559 | Conformal doping for FinFET devices | Veeraraghavan S. Basker, Nathaniel Berliner, Hyun-Jin Cho, Johnathan E. Faltermeier, Tenko Yamashita | 2015-08-11 |
| 8927422 | Raised silicide contact | Emre Alptekin, Nathaniel Berliner, Christian Lavoie, Ahmet S. Ozcan | 2015-01-06 |
| 8741782 | Charging-free electron beam cure of dielectric material | Christos D. Dimitrakopoulos, Robert L. Wisnieff | 2014-06-03 |
| 8525123 | Charging-free electron beam cure of dielectric material | Christos D. Dimitrakopoulos, Robert L. Wisnieff | 2013-09-03 |
| 8114748 | Shallow extension regions having abrupt extension junctions | Paul A. Ronsheim | 2012-02-14 |
| 7705345 | High performance strained silicon FinFETs device and method for forming same | Stephen W. Bedell, Kevin K. Chan, Dureseti Chidambarrao, Silke H. Christianson, Jack O. Chu +4 more | 2010-04-27 |
| 7691733 | Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics | Keith E. Fogel, Katherine L. Saenger, Chun-Yung Sung, Haizhou Yin | 2010-04-06 |
| 7547616 | Laser processing method for trench-edge-defect-free solid phase epitaxy in confined geometrics | Keith E. Fogel, Katherine L. Saenger, Chun-Yung Sung, Haizhou Yin | 2009-06-16 |
| 7163867 | Method for slowing down dopant-enhanced diffusion in substrates and devices fabricated therefrom | Huilong Zhu | 2007-01-16 |
| 7074684 | Elevated source drain disposable spacer CMOS | Ronnen Andrew Roy, Cyril Cabral, Jr., Christian Lavoie | 2006-07-11 |