Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8029975 | Fused aromatic structures and methods for photolithographic applications | Wu-Song Huang, Pushkara R. Varanasi, Roy R. Yu | 2011-10-04 |
| 7994639 | Microelectronic structure including dual damascene structure and high contrast alignment mark | Gerald W. Gibson, Mary B. Rothwell, Roy R. Yu | 2011-08-09 |
| 7893549 | Microelectronic lithographic alignment using high contrast alignment mark | Mary B. Rothwell, Robert Luke Wisneiff, Roy R. Yu | 2011-02-22 |
| 7695897 | Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer | Gerald W. Gibson, Mary B. Rothwell, Roy R. Yu | 2010-04-13 |
| 7659050 | High resolution silicon-containing resist | Wu-Song Huang, David P. Klaus, Lidija Sekaric, Raman Viswanathan | 2010-02-09 |
| 7566527 | Fused aromatic structures and methods for photolithographic applications | Wu-Song Huang, Pushkara R. Varanasi, Roy R. Yu | 2009-07-28 |
| 7399573 | Method for using negative tone silicon-containing resist for e-beam lithography | Wu-Song Huang, Lidija Sekaric, David P. Klaus, Raman Viswanathan | 2008-07-15 |
| 6617086 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, Karen E. Petrillo +1 more | 2003-09-09 |
| 6251569 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, Karen E. Petrillo +1 more | 2001-06-26 |
| 6043003 | E-beam application to mask making using new improved KRS resist system | Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo | 2000-03-28 |
| 6037097 | E-beam application to mask making using new improved KRS resist system | Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo | 2000-03-14 |