| 8029975 |
Fused aromatic structures and methods for photolithographic applications |
Wu-Song Huang, Pushkara R. Varanasi, Roy R. Yu |
2011-10-04 |
| 7994639 |
Microelectronic structure including dual damascene structure and high contrast alignment mark |
Gerald W. Gibson, Mary B. Rothwell, Roy R. Yu |
2011-08-09 |
| 7893549 |
Microelectronic lithographic alignment using high contrast alignment mark |
Mary B. Rothwell, Robert Luke Wisneiff, Roy R. Yu |
2011-02-22 |
| 7695897 |
Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer |
Gerald W. Gibson, Mary B. Rothwell, Roy R. Yu |
2010-04-13 |
| 7659050 |
High resolution silicon-containing resist |
Wu-Song Huang, David P. Klaus, Lidija Sekaric, Raman Viswanathan |
2010-02-09 |
| 7566527 |
Fused aromatic structures and methods for photolithographic applications |
Wu-Song Huang, Pushkara R. Varanasi, Roy R. Yu |
2009-07-28 |
| 7399573 |
Method for using negative tone silicon-containing resist for e-beam lithography |
Wu-Song Huang, Lidija Sekaric, David P. Klaus, Raman Viswanathan |
2008-07-15 |
| 6617086 |
Forming a pattern of a negative photoresist |
Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, Karen E. Petrillo +1 more |
2003-09-09 |
| 6251569 |
Forming a pattern of a negative photoresist |
Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina Babich, Karen E. Petrillo +1 more |
2001-06-26 |
| 6043003 |
E-beam application to mask making using new improved KRS resist system |
Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo |
2000-03-28 |
| 6037097 |
E-beam application to mask making using new improved KRS resist system |
Wu-Song Huang, Ahmad D. Katnani, Kim Y. Lee, Wayne M. Moreau, Karen E. Petrillo |
2000-03-14 |
