Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6685853 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Marie Angelopoulos, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger | 2004-02-03 |
| 6617086 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more | 2003-09-09 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Ari Aviram, Timothy A. Brunner, Thomas B. Faure, C. Richard Guarnieri +2 more | 2002-08-20 |
| 6251569 | Forming a pattern of a negative photoresist | Marie Angelopoulos, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more | 2001-06-26 |
| 6132644 | Energy sensitive electrically conductive admixtures | Marie Angelopoulos, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger | 2000-10-17 |
| 5830332 | Sputter deposition of hydrogenated amorphous carbon film and applications thereof | Alessandro C. Callegari, Fuad E. Doany, Sampath Purushothaman | 1998-11-03 |
| 5770345 | Photoresist having increased sensitivity and use thereof | Karen E. Petrillo, John P. Simons, David E. Seeger | 1998-06-23 |
| 5753412 | Photoresist having increased sensitivity and use thereof | Karen E. Petrillo, John P. Simons, David E. Seeger | 1998-05-19 |
| 5593812 | Photoresist having increased sensitivity and use thereof | Karen E. Petrillo, John P. Simons, David E. Seeger | 1997-01-14 |
| 5565529 | Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability | Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw | 1996-10-15 |
| 5457005 | Dry developable photoresist and use thereof | Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino | 1995-10-10 |
| 5286599 | Base developable negative photoresist composition and use thereof | Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak +2 more | 1994-02-15 |
| 5238773 | Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups | Donis Flagello, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw, David F. Witman | 1993-08-24 |
| 5229251 | Dry developable photoresist containing an epoxide, organosilicon and onium salt | Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino | 1993-07-20 |
| 5141817 | Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability | Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw | 1992-08-25 |
| 5115095 | Epoxy functional organosilicon polymer | Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-05-19 |
| 5110711 | Method for forming a pattern | Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-05-05 |
| 5098816 | Method for forming a pattern of a photoresist | Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1992-03-24 |
| 5059512 | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions | Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman | 1991-10-22 |
| 4981909 | Plasma-resistant polymeric material, preparation thereof, and use thereof | Michael Hatzakis, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman | 1991-01-01 |
| 4782008 | Plasma-resistant polymeric material, preparation thereof, and use thereof | Michael Hatzakis, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman | 1988-11-01 |
| 4693960 | Photolithographic etching process using organosilicon polymer composition | Michael Hatzakis, John J. Liutkis, Juri R. Parasczak, Jane M. Shaw | 1987-09-15 |
| 4603195 | Organosilicon compound and use thereof in photolithography | Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw | 1986-07-29 |
| 4369897 | Product storing and dispensing apparatus | Elmer B. Offutt, William G. Gillett | 1983-01-25 |