| 6685853 |
Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith |
Marie Angelopoulos, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger |
2004-02-03 |
$8,997,000 |
| 6617086 |
Forming a pattern of a negative photoresist |
Marie Angelopoulos, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more |
2003-09-09 |
$18,984,000 |
| 6436605 |
Plasma resistant composition and use thereof |
Marie Angelopoulos, Ari Aviram, Timothy A. Brunner, Thomas B. Faure, C. Richard Guarnieri +2 more |
2002-08-20 |
$9,830,000 |
| 6251569 |
Forming a pattern of a negative photoresist |
Marie Angelopoulos, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more |
2001-06-26 |
$22,108,000 |
| 6132644 |
Energy sensitive electrically conductive admixtures |
Marie Angelopoulos, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger |
2000-10-17 |
$30,556,000 |
| 5830332 |
Sputter deposition of hydrogenated amorphous carbon film and applications thereof |
Alessandro C. Callegari, Fuad E. Doany, Sampath Purushothaman |
1998-11-03 |
$14,328,000 |
| 5770345 |
Photoresist having increased sensitivity and use thereof |
Karen E. Petrillo, John P. Simons, David E. Seeger |
1998-06-23 |
$13,396,000 |
| 5753412 |
Photoresist having increased sensitivity and use thereof |
Karen E. Petrillo, John P. Simons, David E. Seeger |
1998-05-19 |
$15,430,000 |
| 5593812 |
Photoresist having increased sensitivity and use thereof |
Karen E. Petrillo, John P. Simons, David E. Seeger |
1997-01-14 |
$25,282,000 |
| 5565529 |
Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability |
Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw |
1996-10-15 |
$13,145,000 |
| 5457005 |
Dry developable photoresist and use thereof |
Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino |
1995-10-10 |
$16,991,000 |
| 5286599 |
Base developable negative photoresist composition and use thereof |
Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak +2 more |
1994-02-15 |
$6,064,000 |
| 5238773 |
Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups |
Donis Flagello, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw, David F. Witman |
1993-08-24 |
$7,496,000 |
| 5229251 |
Dry developable photoresist containing an epoxide, organosilicon and onium salt |
Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino |
1993-07-20 |
$7,702,000 |
| 5141817 |
Dielectric structures having embedded gap filling RIE etch stop polymeric materials of high thermal stability |
Michael Hatzakis, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Jane M. Shaw |
1992-08-25 |
$9,629,000 |
| 5115095 |
Epoxy functional organosilicon polymer |
Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-05-19 |
$17,072,000 |
| 5110711 |
Method for forming a pattern |
Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-05-05 |
$25,866,000 |
| 5098816 |
Method for forming a pattern of a photoresist |
Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1992-03-24 |
$12,540,000 |
| 5059512 |
Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
Jeffrey D. Gelorme, Michael Hatzakis, Jane M. Shaw, Kevin J. Stewart, David F. Witman |
1991-10-22 |
$12,556,000 |
| 4981909 |
Plasma-resistant polymeric material, preparation thereof, and use thereof |
Michael Hatzakis, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman |
1991-01-01 |
|
| 4782008 |
Plasma-resistant polymeric material, preparation thereof, and use thereof |
Michael Hatzakis, Scott Jacobs, Juri R. Parasczcak, Jane M. Shaw, David F. Witman |
1988-11-01 |
$20,495,000 |
| 4693960 |
Photolithographic etching process using organosilicon polymer composition |
Michael Hatzakis, John J. Liutkis, Juri R. Parasczak, Jane M. Shaw |
1987-09-15 |
$83,062,000 |
| 4603195 |
Organosilicon compound and use thereof in photolithography |
Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw |
1986-07-29 |
$21,696,000 |
| 4369897 |
Product storing and dispensing apparatus |
Elmer B. Offutt, William G. Gillett |
1983-01-25 |
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