Issued Patents All Time
Showing 25 most recent of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058644 | Nanostructure for molecular electronics comprising collinear metal lines defining precise nanoscale gap | — | 2011-11-15 |
| 7824619 | Molecular sensors for explosives | — | 2010-11-02 |
| 6989290 | Electrical contacts for molecular electronic transistors | — | 2006-01-24 |
| 6821718 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2004-11-23 |
| 6689540 | Polymers and use thereof | C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros | 2004-02-10 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2003-11-25 |
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau | 2003-01-07 |
| 6458907 | Organometallic polymers and use thereof | Marie Angelopoulos, C. Richard Guarnieri, Ranee W. Kwong | 2002-10-01 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Edward D. Babich, Timothy A. Brunner, Thomas B. Faure, C. Richard Guarnieri +2 more | 2002-08-20 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang +3 more | 2002-07-16 |
| 6420088 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau | 2002-07-16 |
| 6348299 | RIE etch resistant nonchemically amplified resist composition and use thereof | Inna V. Babich | 2002-02-19 |
| 6346362 | Polymers and use thereof | C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros | 2002-02-12 |
| 6280908 | Post-development resist hardening by vapor silylation | Michael J. Rooks | 2001-08-28 |
| 6280901 | High sensitivity, photo-active polymer and developers for high resolution resist applications | Andrew T. S. Pomerene, David E. Seeger | 2001-08-28 |
| 6197896 | Graft polymers and use thereof | Inna V. Babich | 2001-03-06 |
| 6171757 | Organometallic polymers and use thereof | Marie Angelopoulos, C. Richard Guarnieri, Ranee W. Kwong | 2001-01-09 |
| 6100011 | High sensitivity, photo-active polymer and developers for high resolution resist applications | Andrew T. S. Pomerene, David E. Seeger | 2000-08-08 |
| 5972571 | Negative resist composition and use thereof | — | 1999-10-26 |
| 5955242 | High sensitivity, photo-active polymer and developers for high resolution resist applications | Andrew T. S. Pomerene, David E. Seeger | 1999-09-21 |
| 5908732 | Polymer compositions for high resolution resist applications | Karen E. Petrillo, Andrew T. S. Pomerene, David E. Seeger | 1999-06-01 |
| 5644038 | Quinone diazo compound containing non-metallic atom | William R. Brunsvold, Daniel Bucca, Willard E. Conley, David E. Seeger | 1997-07-01 |
| 5567569 | Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring | William R. Brunsvold, Daniel Bucca, Willard E. Conley, David E. Seeger | 1996-10-22 |
| 5552256 | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring | William R. Brunsvold, Daniel Bucca, Willard E. Conley, David E. Seeger | 1996-09-03 |
| 4692044 | Interface resistance and knee voltage enhancement in resistive ribbon printing | Kwang K. Shih | 1987-09-08 |