| 6858357 |
Attenuated embedded phase shift photomask blanks |
Marie Angelopoulos, Katherina Babich, Cameron Brooks, S. Jay Chey, Michael S. Hibbs +1 more |
2005-02-22 |
| 6689540 |
Polymers and use thereof |
Ari Aviram, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros |
2004-02-10 |
| 6653027 |
Attenuated embedded phase shift photomask blanks |
Marie Angelopoulos, Katherina Babich, Cameron Brooks, S. Jay Chey, Michael S. Hibbs +1 more |
2003-11-25 |
| 6503692 |
Antireflective silicon-containing compositions as hardmask layer |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau |
2003-01-07 |
| 6458907 |
Organometallic polymers and use thereof |
Marie Angelopoulos, Ari Aviram, Ranee W. Kwong |
2002-10-01 |
| 6436605 |
Plasma resistant composition and use thereof |
Marie Angelopoulos, Ari Aviram, Edward D. Babich, Timothy A. Brunner, Thomas B. Faure +2 more |
2002-08-20 |
| 6420084 |
Mask-making using resist having SIO bond-containing polymer |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang +3 more |
2002-07-16 |
| 6420088 |
Antireflective silicon-containing compositions as hardmask layer |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau |
2002-07-16 |
| 6346362 |
Polymers and use thereof |
Ari Aviram, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros |
2002-02-12 |
| 6180291 |
Static resistant reticle |
Andrew Bessy, James P. Doyle, Vaughn P. Gross, Rick J. Heh, Kenneth D. Murray +1 more |
2001-01-30 |
| 6171757 |
Organometallic polymers and use thereof |
Marie Angelopoulos, Ari Aviram, Ranee W. Kwong |
2001-01-09 |
| 5716486 |
Method and apparatus for tuning field for plasma processing using corrected electrode |
Gary S. Selwyn, Manoj Dalvie, James J. McGill, Gary W. Rubolff, Maheswaran Surendra |
1998-02-10 |
| 5622635 |
Method for enhanced inductive coupling to plasmas with reduced sputter contamination |
Jerome J. Cuomo, Jeffrey A. Hopwood |
1997-04-22 |
| 5433812 |
Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination |
Jerome J. Cuomo, Jeffrey A. Hopwood |
1995-07-18 |
| 5064681 |
Selective deposition process for physical vapor deposition |
Christopher J. Berry, Jerome J. Cuomo, Dennis S. Yee |
1991-11-12 |
| 4925700 |
Process for fabricating high density disc storage device |
Blasius Brezoczky, Jerome J. Cuomo, Kumbakonam V. Ramanathan, Srinvasrao A. Shivashankar, David A. Smith +1 more |
1990-05-15 |
| 4686332 |
Combined finger touch and stylus detection system for use on the viewing surface of a visual display device |
Evon C. Greanias, John J. Seeland, Jr., Guy F. Verrier, Robert L. Donaldson |
1987-08-11 |
| 4521442 |
Radiant energy collector having plasma-textured polyimide exposed surface |
— |
1985-06-04 |
| 4478209 |
Radiant energy collector having plasma-textured polyimide exposed surface |
— |
1984-10-23 |