Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7638266 | Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer | Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Wenjie Li, David R. Medeiros +2 more | 2009-12-29 |
| 7314700 | High sensitivity resist compositions for electron-based lithography | Wu-Song Huang, Wenjie Li, Wayne M. Moreau, David R. Medeiros, Karen E. Petrillo +1 more | 2008-01-01 |
| 6979518 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more | 2005-12-27 |
| 6821718 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Qinghuang Lin +1 more | 2004-11-23 |
| 6730445 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more | 2004-05-04 |
| 6682860 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more | 2004-01-27 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Qinghuang Lin +1 more | 2003-11-25 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Arpan Mahorowala +3 more | 2003-07-01 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more | 2002-07-16 |
| 5976710 | Low TCE polyimides as improved insulator in multilayer interconnect structures | Krishna G. Sachdev, John P. Hummel, Sundar M. Kamath, Anton Nendaic, Charles H. Perry +1 more | 1999-11-02 |
| 5399462 | Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane | Krishna G. Sachdev, Premlatha Jagannathan, Harbans S. Sachdev, Ratnam Sooriyakumaran, Joel R. Whitaker | 1995-03-21 |
| 5240812 | Top coat for acid catalyzed resists | Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Christopher F. Lyons, Steve S. Miura +3 more | 1993-08-31 |
| 5115090 | Viscosity stable, essentially gel-free polyamic acid compositions | Krishna G. Sachdev, John P. Hummel, Ranee W. Kwong, Leo L. Linehan, Harbans S. Sachdev | 1992-05-19 |