| 7638266 |
Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer |
Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Wenjie Li, David R. Medeiros +2 more |
2009-12-29 |
$22,760,000 |
| 7314700 |
High sensitivity resist compositions for electron-based lithography |
Wu-Song Huang, Wenjie Li, Wayne M. Moreau, David R. Medeiros, Karen E. Petrillo +1 more |
2008-01-01 |
|
| 6979518 |
Attenuated embedded phase shift photomask blanks |
Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more |
2005-12-27 |
$5,960,000 |
| 6821718 |
Radiation sensitive silicon-containing negative resists and use thereof |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Qinghuang Lin +1 more |
2004-11-23 |
$4,043,000 |
| 6730445 |
Attenuated embedded phase shift photomask blanks |
Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more |
2004-05-04 |
$7,309,000 |
| 6682860 |
Attenuated embedded phase shift photomask blanks |
Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Arpan Mahorowala +1 more |
2004-01-27 |
$11,745,000 |
| 6653045 |
Radiation sensitive silicon-containing negative resists and use thereof |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Qinghuang Lin +1 more |
2003-11-25 |
$5,480,000 |
| 6586156 |
Etch improved resist systems containing acrylate (or methacrylate) silane monomers |
Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Arpan Mahorowala +3 more |
2003-07-01 |
$13,647,000 |
| 6420084 |
Mask-making using resist having SIO bond-containing polymer |
Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more |
2002-07-16 |
$9,944,000 |
| 5976710 |
Low TCE polyimides as improved insulator in multilayer interconnect structures |
Krishna G. Sachdev, John P. Hummel, Sundar M. Kamath, Anton Nendaic, Charles H. Perry +1 more |
1999-11-02 |
$18,540,000 |
| 5399462 |
Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane |
Krishna G. Sachdev, Premlatha Jagannathan, Harbans S. Sachdev, Ratnam Sooriyakumaran, Joel R. Whitaker |
1995-03-21 |
$19,868,000 |
| 5240812 |
Top coat for acid catalyzed resists |
Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Christopher F. Lyons, Steve S. Miura +3 more |
1993-08-31 |
$6,793,000 |
| 5115090 |
Viscosity stable, essentially gel-free polyamic acid compositions |
Krishna G. Sachdev, John P. Hummel, Ranee W. Kwong, Leo L. Linehan, Harbans S. Sachdev |
1992-05-19 |
|
