Issued Patents All Time
Showing 25 most recent of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9235119 | Exposure photolithography methods | Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi | 2016-01-12 |
| 9040225 | Developable bottom antireflective coating composition and pattern forming method using thereof | Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu | 2015-05-26 |
| 9012133 | Removal of alkaline crystal defects in lithographic patterning | Javier Perez, Dario L. Goldfarb, Libor Vyklicky | 2015-04-21 |
| 8999624 | Developable bottom antireflective coating composition and pattern forming method using thereof | Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu | 2015-04-07 |
| 8846296 | Photoresist compositions | Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi | 2014-09-30 |
| 8835307 | Method and structure for reworking antireflective coating over semiconductor substrate | Hakeem B. S. Akinmade-Yusuff, John A. Fitzsimmons | 2014-09-16 |
| 8568960 | Multiple exposure photolithography methods | Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi | 2013-10-29 |
| 8373271 | Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication | Dario L. Goldfarb, Qinghuang Lin, Deborah A. Neumayer, Hosadurga Shobha | 2013-02-12 |
| 8288271 | Method for reworking antireflective coating over semiconductor substrate | Hakeem Akinmade Yusuff, John A. Fitzsimmons | 2012-10-16 |
| 8236476 | Multiple exposure photolithography methods and photoresist compositions | Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi | 2012-08-07 |
| 8202678 | Wet developable bottom antireflective coating composition and method for use thereof | Kuang-Jung Chen, Mahmoud Khojasteh, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more | 2012-06-19 |
| 8053172 | Photoresists and methods for optical proximity correction | Scott D. Halle, Wu-Song Huang, Pushkara R. Varanasi | 2011-11-08 |
| 8021828 | Photoresist compositions and methods related to near field masks | Wu-Song Huang, Pushkara R. Varanasi | 2011-09-20 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof | Kuang-Jung Chen, Mahmoud Khojasteh, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more | 2009-07-21 |
| 7168224 | Method of making a packaged radiation sensitive resist film-coated workpiece | Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2007-01-30 |
| 6939664 | Low-activation energy silicon-containing resist system | Wu-Song Huang, Robert David Allen, Marie Angelopoulos, Ratnam Sooriyakumaran | 2005-09-06 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more | 2005-08-09 |
| 6821718 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Robert N. Lang, Qinghuang Lin +1 more | 2004-11-23 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Mahmoud Khojasteh, Timothy Hughes, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more | 2004-11-16 |
| 6770418 | Positive resist compositions containing non-polymeric silicon | Wenjie Li, Pushkara R. Varanasi | 2004-08-03 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Mahmoud Khojasteh, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen, Phillip Brock +2 more | 2004-08-03 |
| 6689540 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, David R. Medeiros | 2004-02-10 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Robert N. Lang, Qinghuang Lin +1 more | 2003-11-25 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Robert N. Lang, Arpan Mahorowala +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2003-04-08 |