| 9235119 |
Exposure photolithography methods |
Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi |
2016-01-12 |
$510,000 |
| 9040225 |
Developable bottom antireflective coating composition and pattern forming method using thereof |
Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu |
2015-05-26 |
$2,909,000 |
| 9012133 |
Removal of alkaline crystal defects in lithographic patterning |
Javier Perez, Dario L. Goldfarb, Libor Vyklicky |
2015-04-21 |
$6,169,000 |
| 8999624 |
Developable bottom antireflective coating composition and pattern forming method using thereof |
Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu |
2015-04-07 |
$3,806,000 |
| 8846296 |
Photoresist compositions |
Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi |
2014-09-30 |
$5,320,000 |
| 8835307 |
Method and structure for reworking antireflective coating over semiconductor substrate |
Hakeem B. S. Akinmade-Yusuff, John A. Fitzsimmons |
2014-09-16 |
$3,547,000 |
| 8568960 |
Multiple exposure photolithography methods |
Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi |
2013-10-29 |
$6,299,000 |
| 8373271 |
Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication |
Dario L. Goldfarb, Qinghuang Lin, Deborah A. Neumayer, Hosadurga Shobha |
2013-02-12 |
$6,681,000 |
| 8288271 |
Method for reworking antireflective coating over semiconductor substrate |
Hakeem Akinmade Yusuff, John A. Fitzsimmons |
2012-10-16 |
$3,795,000 |
| 8236476 |
Multiple exposure photolithography methods and photoresist compositions |
Kuang-Jung Chen, Wu-Song Huang, Sen Liu, Pushkara R. Varanasi |
2012-08-07 |
$7,112,000 |
| 8202678 |
Wet developable bottom antireflective coating composition and method for use thereof |
Kuang-Jung Chen, Mahmoud Khojasteh, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more |
2012-06-19 |
$12,855,000 |
| 8053172 |
Photoresists and methods for optical proximity correction |
Scott D. Halle, Wu-Song Huang, Pushkara R. Varanasi |
2011-11-08 |
$3,097,000 |
| 8021828 |
Photoresist compositions and methods related to near field masks |
Wu-Song Huang, Pushkara R. Varanasi |
2011-09-20 |
$5,575,000 |
| 7563563 |
Wet developable bottom antireflective coating composition and method for use thereof |
Kuang-Jung Chen, Mahmoud Khojasteh, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more |
2009-07-21 |
$14,996,000 |
| 7168224 |
Method of making a packaged radiation sensitive resist film-coated workpiece |
Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more |
2007-01-30 |
$4,520,000 |
| 6939664 |
Low-activation energy silicon-containing resist system |
Wu-Song Huang, Robert David Allen, Marie Angelopoulos, Ratnam Sooriyakumaran |
2005-09-06 |
$5,379,000 |
| 6927015 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more |
2005-08-09 |
$5,698,000 |
| 6821718 |
Radiation sensitive silicon-containing negative resists and use thereof |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Robert N. Lang, Qinghuang Lin +1 more |
2004-11-23 |
$4,043,000 |
| 6818381 |
Underlayer compositions for multilayer lithographic processes |
Mahmoud Khojasteh, Timothy Hughes, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more |
2004-11-16 |
$5,414,000 |
| 6770418 |
Positive resist compositions containing non-polymeric silicon |
Wenjie Li, Pushkara R. Varanasi |
2004-08-03 |
$6,296,000 |
| 6770419 |
Low silicon-outgassing resist for bilayer lithography |
Mahmoud Khojasteh, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen, Phillip Brock +2 more |
2004-08-03 |
$6,296,000 |
| 6689540 |
Polymers and use thereof |
Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, David R. Medeiros |
2004-02-10 |
$15,099,000 |
| 6653045 |
Radiation sensitive silicon-containing negative resists and use thereof |
Marie Angelopoulos, Ari Aviram, Wu-Song Huang, Robert N. Lang, Qinghuang Lin +1 more |
2003-11-25 |
$5,480,000 |
| 6586156 |
Etch improved resist systems containing acrylate (or methacrylate) silane monomers |
Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Robert N. Lang, Arpan Mahorowala +3 more |
2003-07-01 |
$13,647,000 |
| 6543617 |
Packaged radiation sensitive coated workpiece process for making and method of storing same |
Marie Angelopoulos, Wu-Song Huang, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more |
2003-04-08 |
$14,785,000 |
