Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8835307 | Method and structure for reworking antireflective coating over semiconductor substrate | John A. Fitzsimmons, Ranee W. Kwong | 2014-09-16 |
| 8796150 | Bilayer trench first hardmask structure and process for reduced defectivity | Samuel S. Choi, Edward R. Engbrecht, John A. Fitzsimmons | 2014-08-05 |
| 8771533 | Edge protection seal for bonded substrates | Mukta G. Farooq, Emily R. Kinser, Richard S. Wise | 2014-07-08 |
| 8679611 | Edge protection seal for bonded substrates | Mukta G. Farooq, Emily R. Kinser, Richard S. Wise | 2014-03-25 |
| 8450212 | Method of reducing critical dimension process bias differences between narrow and wide damascene wires | Matthew S. Angyal, Oluwafemi O. Ogunsola | 2013-05-28 |
| 8287980 | Edge protection seal for bonded substrates | Mukta G. Farooq, Emily R. Kinser, Richard S. Wise | 2012-10-16 |
| 8138093 | Method for forming trenches having different widths and the same depth | Samuel S. Choi | 2012-03-20 |
| 8030157 | Liner protection in deep trench etching | Habib Hichri, Ahmad D. Katnani, Kaushik A. Kumar, Narender Rana, Richard S. Wise | 2011-10-04 |