SC

Samuel S. Choi

IBM: 40 patents #2,346 of 70,183Top 4%
Globalfoundries: 12 patents #298 of 4,424Top 7%
FS Freeescale Semiconductor: 1 patents #2,021 of 3,767Top 55%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
Overall (All Time): #48,860 of 4,157,543Top 2%
53
Patents All Time

Issued Patents All Time

Showing 25 most recent of 53 patents

Patent #TitleCo-InventorsDate
12150393 Heater for phase change material memory cell Victor Chan, Jin-Ping Han, Injo Ok 2024-11-19
11908944 Contact formation for vertical field effect transistors Heng Wu, Lan Yu, Ruilong Xie 2024-02-20
10832946 Recessed interconnet line having a low-oxygen cap for facilitating a robust planarization process and protecting the interconnect line from downstream etch operations Hari Prasad Amanapu 2020-11-10
10256186 Interconnect structure having subtractive etch feature and damascene feature Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2019-04-09
10224236 Forming air gap Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Griselda Bonilla, Andrew H. Simon 2019-03-05
10186482 Self aligned via fuse Junjing Bao, Wai-Kin Li 2019-01-22
10177031 Subtractive etch interconnects Junjing Bao, Griselda Bonilla, Ronald G. Filippi, Naftali E. Lustig, Andrew H. Simon 2019-01-08
10103068 Detecting a void between a via and a wiring line Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2018-10-16
9893011 Back-end electrically programmable fuse Junjing Bao, Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow +3 more 2018-02-13
9852980 Interconnect structure having substractive etch feature and damascene feature Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2017-12-26
9755016 Integration process to form microelectronic or micromechanical structures Wai-Kin Li 2017-09-05
9685404 Back-end electrically programmable fuse Junjing Bao, Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow +3 more 2017-06-20
9601426 Interconnect structure having subtractive etch feature and damascene feature Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2017-03-21
9536830 High performance refractory metal / copper interconnects to eliminate electromigration Junjing Bao, Griselda Bonilla, Ronald G. Filippi, Naftali E. Lustig, Andrew H. Simon 2017-01-03
9536842 Structure with air gap crack stop Junjing Bao, Griselda Bonilla, Ronald G. Filippi, Xiao Hu Liu, Naftali E. Lustig +1 more 2017-01-03
9502350 Interconnect scaling method including forming dielectric layer over subtractively etched first conductive layer and forming second conductive material on dielectric layer Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2016-11-22
9455186 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, James A. Culp, Thomas W. Dyer +4 more 2016-09-27
9431292 Alternate dual damascene method for forming interconnects Griselda Bonilla, Ronald G. Filippi, Elbert E. Huang, Naftali E. Lustig, Andrew H. Simon 2016-08-30
9431346 Graphene-metal E-fuse Junjing Bao, Griselda Bonilla, Ronald G. Filippi, Andrew Tae Kim, Naftali E. Lustig +1 more 2016-08-30
9425144 Metal fuse structure for improved programming capability Griselda Bonilla, Kaushik Chanda, Ronald G. Filippi, Stephan Grunow, Naftali E. Lustig +2 more 2016-08-23
9406560 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, James A. Culp, Thomas W. Dyer +4 more 2016-08-02
9385038 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, James A. Culp, Thomas W. Dyer +4 more 2016-07-05
9324655 Modified via bottom for beol via efuse Junjing Bao, Griselda Bonilla, Ronald G. Filippi, Naftali E. Lustig, Andrew H. Simon 2016-04-26
9324635 Semiconductor interconnect structure having a graphene-based barrier metal layer Junjing Bao, Xuesong Li, Shaoning Yao 2016-04-26
9324634 Semiconductor interconnect structure having a graphene-based barrier metal layer Junjing Bao, Shaoning Yao, Xuesong Li 2016-04-26