TD

Thomas W. Dyer

IBM: 90 patents #680 of 70,183Top 1%
Infineon Technologies Ag: 13 patents #986 of 7,486Top 15%
Samsung: 7 patents #17,688 of 75,807Top 25%
CM Chartered Semiconductor Manufacturing: 4 patents #148 of 840Top 20%
Globalfoundries: 3 patents #1,029 of 4,424Top 25%
IN Infineon: 1 patents #4 of 37Top 15%
Overall (All Time): #16,540 of 4,157,543Top 1%
94
Patents All Time

Issued Patents All Time

Showing 25 most recent of 94 patents

Patent #TitleCo-InventorsDate
9455186 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, James A. Culp +4 more 2016-09-27
9431535 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Haining Yang 2016-08-30
9406560 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, James A. Culp +4 more 2016-08-02
9385038 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, James A. Culp +4 more 2016-07-05
9276111 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Haining Yang 2016-03-01
9171848 Deep trench MIM capacitor and moat isolation with epitaxial semiconductor wafer scheme Herbert L. Ho, Jin Ping Liu 2015-10-27
9157980 Measuring metal line spacing in semiconductor devices Stephen E. Greco 2015-10-13
9076847 Selective local metal cap layer formation for improved electromigration behavior Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, James A. Culp +4 more 2015-07-07
9059177 Doping of copper wiring structures in back end of line processing Daniel C. Edelstein, Tze-man Ko, Andrew H. Simon, Wei-Tsu Tseng 2015-06-16
9018097 Semiconductor device processing with reduced wiring puddle formation Hanako Henry, Tze-man Ko, Yiheng Xu, Shaoning Yao 2015-04-28
8896069 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Haining Yang 2014-11-25
8889504 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Haining Yang 2014-11-18
8853746 CMOS devices with stressed channel regions, and methods for fabricating the same Xiangdong Chen, Kenneth T. Settlemyer, Jr., Haining Yang 2014-10-07
8765602 Doping of copper wiring structures in back end of line processing Daniel C. Edelstein, Tze-man Ko, Andrew H. Simon, Wei-Tsu Tseng 2014-07-01
8697528 Method of forming a planar field effect transistor structure with recesses for epitaxially deposited source/drain regions 2014-04-15
8685806 Silicon-on-insulator substrate with built-in substrate junction Junedong Lee, Dominic J. Schepis 2014-04-01
8623673 Structure and method for detecting defects in BEOL processing Tze-man Ko, Yiheng Xu, Shaoning Yao 2014-01-07
8482009 Silicon-on-insulator substrate with built-in substrate junction Junedong Lee, Dominic J. Schepis 2013-07-09
8377785 Planar field effect transistor structure having an angled crystallographic etch-defined source/drain recess and a method of forming the transistor structure 2013-02-19
8362531 Method of patterning semiconductor structure and structure thereof James J. Toomey 2013-01-29
8293631 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Haining Yang 2012-10-23
8198194 Methods of forming p-channel field effect transistors having SiGe source/drain regions Jong-ho Yang, Hyung-Rae Lee, Jin-Ping Han, Chung Woh Lai, Henry K. Utomo 2012-06-12
8159031 SOI substrates and SOI devices, and methods for forming the same Zhijiong Luo, Haining Yang 2012-04-17
8110464 SOI protection for buried plate implant and DT bottle ETCH Herbert L. Ho, Ravi M. Todi 2012-02-07
8063449 Semiconductor devices and methods of manufacture thereof Jin-Ping Han, Henry K. Utomo, Rajendran Krishnasamy 2011-11-22