Issued Patents All Time
Showing 25 most recent of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9898573 | Rule and process assumption co-optimization using feature-specific layout-based statistical analyses | Chieh-Yu Lin, Dongbing Shao | 2018-02-20 |
| 9836570 | Semiconductor layout generation | Atsushi Azuma, Yuping Cui, Marco Facchini, Shaoning Yao | 2017-12-05 |
| 9455186 | Selective local metal cap layer formation for improved electromigration behavior | Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, Thomas W. Dyer +4 more | 2016-09-27 |
| 9406560 | Selective local metal cap layer formation for improved electromigration behavior | Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, Thomas W. Dyer +4 more | 2016-08-02 |
| 9385038 | Selective local metal cap layer formation for improved electromigration behavior | Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, Thomas W. Dyer +4 more | 2016-07-05 |
| 9311443 | Correcting for stress induced pattern shifts in semiconductor manufacturing | Dureseti Chidambarrao, Paul C. Parries, Ian P. Stobert | 2016-04-12 |
| 9311442 | Net-voltage-aware optical proximity correction (OPC) | Shayak Banerjee, Ian P. Stobert | 2016-04-12 |
| 9076847 | Selective local metal cap layer formation for improved electromigration behavior | Matthew S. Angyal, Junjing Bao, Griselda Bonilla, Samuel S. Choi, Thomas W. Dyer +4 more | 2015-07-07 |
| 9075106 | Detecting chip alterations with light emission | Kerry Bernstein, David F. Heidel, Dirk Pfeiffer, Anthony D. Polson, Peilin Song +2 more | 2015-07-07 |
| 8997028 | Methods and system for analysis and management of parametric yield | Paul Chang, Dureseti Chidambarrao, Praveen Elakkumanan, Jason D. Hibbeler, Anda C. Mocuta | 2015-03-31 |
| 8473885 | Physical design system and method | John M. Cohn, Ulrich A. Finkler, Fook-Luen Heng, Mark A. Lavin, Jin-Fuw Lee +6 more | 2013-06-25 |
| 8470713 | Nitride etch for improved spacer uniformity | John J. Ellis-Monaghan, Jeffrey P. Gambino, Kirk D. Peterson, Jed H. Rankin, Christa R. Willets | 2013-06-25 |
| 8458625 | Yield enhancement by multiplicate-layer-handling optical correction | Pavan Y. Bashaboina | 2013-06-04 |
| 8429576 | Methods and system for analysis and management of parametric yield | Paul Chang, Dureseti Chidambarrao, Praveen Elakkumanan, Jason D. Hibbeler, Anda C. Mocuta | 2013-04-23 |
| 8418087 | Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance | Shayak Banerjee, Dureseti Chidambarrao, Praveen Elakkumanan, Saibal Mukhopadhyay | 2013-04-09 |
| 8381141 | Method and system for comparing lithographic processing conditions and or data preparation processes | Stephen E. Fischer, Robert T. Sayah | 2013-02-19 |
| 8347260 | Method of designing an integrated circuit based on a combination of manufacturability, test coverage and, optionally, diagnostic coverage | Kerry Bernstein, Leah M. P. Pastel, Kirk D. Peterson, Norman J. Rohrer | 2013-01-01 |
| 8347259 | Circuit enhancement by multiplicate-layer-handling circuit simulation | Pavan Y. Bashaboina | 2013-01-01 |
| 8336008 | Characterization of long range variability | Jerry D. Hayes, Ying Liu, Anthony D. Polson | 2012-12-18 |
| 8301290 | System and method for correcting systematic parametric variations on integrated circuit chips in order to minimize circuit limited yield loss | John J. Ellis-Monaghan, Jeffrey P. Gambino, Kirk D. Peterson, Jed H. Rankin | 2012-10-30 |
| 8302068 | Leakage aware design post-processing | Lars Liebmann | 2012-10-30 |
| 8239790 | Methods and system for analysis and management of parametric yield | Paul Chang, Dureseti Chidambarrao, Praveen Elakkumanan, Jason D. Hibbeler, Anda C. Mocuta | 2012-08-07 |
| 8232215 | Spacer linewidth control | Jeffrey P. Gambino, John J. Ellis-Monaghan, Kirk D. Peterson, Jed H. Rankin | 2012-07-31 |
| 8219943 | Physical design system and method | John M. Cohn, Ulrich A. Finkler, Fook-Luen Heng, Mark A. Lavin, Jin-Fuw Lee +6 more | 2012-07-10 |
| 8214770 | Multilayer OPC for design aware manufacturing | Maharaj Mukherjee, Lars Liebmann, Scott M. Mansfield | 2012-07-03 |