Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8176444 | Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance | Shayak Banerjee, Dureseti Chidambarrao, Praveen Elakkumanan, Saibal Mukhopadhyay | 2012-05-08 |
| 8161422 | Fast and accurate method to simulate intermediate range flare effects | Maharaj Mukherjee, Scott M. Mansfield, Kafai Lai, Alan E. Rosenbluth | 2012-04-17 |
| 8141027 | Automated sensitivity definition and calibration for design for manufacturing tools | Jason D. Hibbeler, Lars Liebmann, Tina Wagner | 2012-03-20 |
| 8042070 | Methods and system for analysis and management of parametric yield | Paul Chang, Dureseti Chidambarrao, Praveen Elakkumanan, Jason D. Hibbeler, Anda C. Mocuta | 2011-10-18 |
| 7975244 | Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks | Maharaj Mukherjee, Alan E. Rosenbluth | 2011-07-05 |
| 7935638 | Methods and structures for enhancing perimeter-to-surface area homogeneity | John J. Ellis-Monaghan, Jeffrey P. Gambino, Kirk D. Peterson, Jed H. Rankin | 2011-05-03 |
| 7900178 | Integrated circuit (IC) design method, system and program product | Gregory A. Northrop, Ming Yin | 2011-03-01 |
| 7890906 | Method of laying out integrated circuit design based on known polysilicon perimeter densities of individual cells | Laura S. Chadwick, David J. Hathaway, Anthony D. Polson | 2011-02-15 |
| 7865864 | Electrically driven optical proximity correction | Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann | 2011-01-04 |
| 7849433 | Integrated circuit with uniform polysilicon perimeter density, method and design structure | Laura S. Chadwick, David J. Hathaway, Anthony D. Polson | 2010-12-07 |
| 7805693 | IC chip design modeling using perimeter density to electrical characteristic correlation | Laura S. Chadwick, Anthony D. Polson | 2010-09-28 |
| 7669175 | Methodology to improve turnaround for integrated circuit design using geometrical hierarchy | Maharaj Mukherjee, Timothy G. Dunham, Mark A. Lavin | 2010-02-23 |
| 7627836 | OPC trimming for performance | Lars Liebmann, Rajeev Malik, K. Paul Muller, Shreesh Narasimha, Stephen L. Runyon +1 more | 2009-12-01 |
| 7565633 | Verifying mask layout printability using simulation with adjustable accuracy | Maharaj Mukherjee, Scott M. Mansfield | 2009-07-21 |
| 7536664 | Physical design system and method | John M. Cohn, Ulrich A. Finkler, Fook-Luen Heng, Mark A. Lavin, Jin-Fuw Lee +6 more | 2009-05-19 |
| 7503028 | Multilayer OPC for design aware manufacturing | Maharaj Mukherjee, Lars Liebmann, Scott M. Mansfield | 2009-03-10 |
| 7473648 | Double exposure double resist layer process for forming gate patterns | Timothy A. Brunner, Lars Liebmann | 2009-01-06 |
| 7450748 | Mask inspection process accounting for mask writer proximity correction | Karen D. Badger, Azalia Krasnoperova | 2008-11-11 |
| 7269808 | Design verification | James A. Bruce, John D. Nickel, Jacek G. Smolinski | 2007-09-11 |
| 6996797 | Method for verification of resolution enhancement techniques and optical proximity correction in lithography | Lars Liebmann, Ioana Graur, Maharaj Mukherjee | 2006-02-07 |
| 6892365 | Method for performing monte-carlo simulations to predict overlay failures in integrated circuit designs | Mark A. Lavin, Robert T. Sayah | 2005-05-10 |
| 6750109 | Halo-free non-rectifying contact on chip with halo source/drain diffusion | Jawahar P. Nayak, Werner Rausch, Melanie J. Sherony, Steven H. Voldman, Noah Zamdmer | 2004-06-15 |
| 6713791 | T-RAM array having a planar cell structure and method for fabricating the same | Louis L. Hsu, Rajiv V. Joshi, Fariborz Assaderaghi, Dan Moy, Werner Rausch | 2004-03-30 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Scott M. Mansfield, Timothy A. Brunner, Alfred Wong | 2003-04-01 |
| 6429482 | Halo-free non-rectifying contact on chip with halo source/drain diffusion | Jawahar P. Nayak, Werner Rausch, Melanie J. Sherony, Steven H. Voldman, Noah Zamdmer | 2002-08-06 |