Issued Patents All Time
Showing 25 most recent of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11703771 | Variable diffraction grating | Ali ALSAQQA, Fadi El-Ghussein, Lambertus Gerardus Maria Kessels, Roxana Rezvani Naraghi, Krishanu SHOME +1 more | 2023-07-18 |
| 10552569 | Method for calculating non-correctable EUV blank flatness for blank dispositioning | Christina A. Turley, Jed H. Rankin, Xuemei Chen, Allen H. Gabor | 2020-02-04 |
| 10012898 | EUV mask for monitoring focus in EUV lithography | Martin Burkhardt | 2018-07-03 |
| 9997348 | Wafer stress control and topography compensation | Oleg Gluschenkov, Donghun Kang, Byeong Y. Kim | 2018-06-12 |
| 9921466 | Method for monitoring focus in EUV lithography | Martin Burkhardt | 2018-03-20 |
| 9899183 | Structure and method to measure focus-dependent pattern shift in integrated circuit imaging | Lei Zhuang | 2018-02-20 |
| 9741581 | Using tensile mask to minimize buckling in substrate | Sunit S. Mahajan, Parul Dhagat, Anne C. Friedman, Shahrukh Khan | 2017-08-22 |
| 9588440 | Method for monitoring focus in EUV lithography | Martin Burkhardt | 2017-03-07 |
| 9411249 | Differential dose and focus monitor | Christopher P. Ausschnitt | 2016-08-09 |
| 9411223 | On-product focus offset metrology for use in semiconductor chip manufacturing | — | 2016-08-09 |
| 9360858 | Alignment data based process control system | Christopher P. Ausschnitt, Allen H. Gabor, Oleg Gluschenkov, Vinayan C. Menon | 2016-06-07 |
| 9310674 | Mask that provides improved focus control using orthogonal edges | Jaione Tirapu Azpiroz, Alan E. Rosenbluth | 2016-04-12 |
| 9075944 | System and method of predicting problematic areas for lithography in a circuit design | Stephen E. Greco, Bernhard R. Liegl, Hua Xiang | 2015-07-07 |
| 8679708 | Polarization monitoring reticle design for high numerical aperture lithography systems | Gregory R. McIntyre | 2014-03-25 |
| 8582078 | Test method for determining reticle transmission stability | Colin J. Brodsky, Michael B. Pike | 2013-11-12 |
| 8484586 | System and method of predicting problematic areas for lithography in a circuit design | Stephen E. Greco, Bernhard R. Liegl, Hua Xiang | 2013-07-09 |
| 8368890 | Polarization monitoring reticle design for high numerical aperture lithography systems | Gregory R. McIntyre | 2013-02-05 |
| 8271910 | EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer | Jaione Tirapu-Azpiroz, Michael S. Hibbs, Alan E. Rosenbluth | 2012-09-18 |
| 8238644 | Fast method to model photoresist images using focus blur and resist blur | Gregg M. Gallatin, Ronald Gordon, Kafai Lai, Alan E. Rosenbluth, Nakgeuon Seong | 2012-08-07 |
| 8239789 | System and method of predicting problematic areas for lithography in a circuit design | Stephen E. Greco, Bernhard R. Liegl, Hua Xiang | 2012-08-07 |
| 8227180 | Photolithography focus improvement by reduction of autofocus radiation transmission into substrate | Sean D. Burns, Kuang-Jung Chen, Wu-Song Huang, Kafai Lai, Wai-Kin Li +1 more | 2012-07-24 |
| 8119322 | Method for producing self-aligned mask, articles produced by same and composition for same | Matthew E. Colburn, Elbert E. Huang, Muthumanickam Sankarapandian | 2012-02-21 |
| 8023102 | Test method for determining reticle transmission stability | Colin J. Brodsky, Michael B. Pike | 2011-09-20 |
| 8001495 | System and method of predicting problematic areas for lithography in a circuit design | Stephen E. Greco, Bernhard R. Liegl, Hua Xiang | 2011-08-16 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Wu-Song Huang, Marie Angelopoulos, Dirk Pfeiffer, Ratnam Sooriyakumaran | 2011-03-08 |